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ASML ASML Holding NV - New York Shares

ASML Holding NV engages in the development, production, marketing, sale and servicing of advanced semiconductor equipment, consisting of lithography related systems. It mainly caters the makers of memory chips and logic chips. The company was founded on April 1, 1984 and is headquartered in Veldhoven, Netherlands.

Company profile

Ticker
ASML, ASMLF
Exchange
Website
CEO
Peter Wennink
Employees
Location
Fiscal year end
Former names
ASM LITHOGRAPHY HOLDING NV
SEC CIK

ASML stock data

(
)

Calendar

10 Feb 21
24 Jun 21
31 Dec 21
Quarter (USD)
Dec 20 Dec 19 Dec 18 Dec 17
Revenue
Cost of revenue
Operating income
Operating margin
Net income
Net profit margin
Cash on hand
Change in cash
Diluted EPS
Annual (USD)
Dec 20 Dec 19 Dec 18 Dec 17
Revenue
Cost of revenue
Operating income
Operating margin
Net income
Net profit margin
Cash on hand
Change in cash
Diluted EPS

Financial data from company earnings reports.

Data for the last complete 13F reporting period. To see the most recent changes to ownership, click the ownership history button above.

18.2% owned by funds/institutions
13F holders
Current Prev Q Change
Total holders 735 666 +10.4%
Opened positions 128 157 -18.5%
Closed positions 59 52 +13.5%
Increased positions 276 281 -1.8%
Reduced positions 214 138 +55.1%
13F shares
Current Prev Q Change
Total value 47.05B 37.14B +26.7%
Total shares 76.36M 76.16M +0.3%
Total puts 2.47M 1.83M +34.9%
Total calls 1.6M 1.51M +6.4%
Total put/call ratio 1.5 1.2 +26.7%
Largest owners
Shares Value Change
TROW T. Rowe Price 10.54M $6.46B -3.2%
Capital World Investors 7.45M $4.6B -6.2%
Capital International Investors 5.49M $3.38B -6.0%
WCM Investment Management 4.49M $2.77B +2.1%
Fisher Asset Management 3.96M $2.45B +2.7%
FMR 3.91M $2.42B -14.9%
State Farm Mutual Automobile Insurance 3.25M $2B 0.0%
JPM JPMorgan Chase & Co. 2.59M $1.6B -12.5%
Sands Capital Management 2.3M $1.42B -0.8%
BLK Blackrock 2M $1.23B +7.2%
Largest transactions
Shares Bought/sold Change
MS Morgan Stanley 1.35M +911.71K +209.4%
FMR 3.91M -683.37K -14.9%
Capital World Investors 7.45M -491.48K -6.2%
Harding Loevner 447.27K +446.97K +148004.0%
JPM JPMorgan Chase & Co. 2.59M -371.28K -12.5%
Capital International Investors 5.49M -349.27K -6.0%
TROW T. Rowe Price 10.54M -347.91K -3.2%
Whale Rock Capital Management 323.63K +323.63K NEW
Citadel Advisors 318.06K -319.99K -50.2%
JHG Janus Henderson 1.33M +234.22K +21.4%

Financial report summary

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Competition
CanonKLA
Content analysis
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Positive
Negative
Uncertain
Constraining
Legalese
Litigous
Readability
8th grade Good
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Proxies

No filings

Patents

APP
Utility
Assembly for Use in Semiconductor Photolithography and Method of Manufacturing Same
17 Jun 21
An optical assembly and a method of making an optical assembly in which additive manufacturing techniques are used to form a support structure either directly on an optical element or on a carrier that is subsequently bonded to an optical element.
APP
Utility
Lithography Supports with Defined Burltop Topography
10 Jun 21
Methods and systems are described for reducing adhesion and controlling friction between a wafer and a wafer table during semiconductor photolithography wherein the tops of burls on the wafer table have a layer with a nanoscale topography.
APP
Utility
Particle Suppression Systems and Methods
10 Jun 21
A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber.
APP
Utility
Substrate Holder for Use In a Lithographic Apparatus
3 Jun 21
A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit.
APP
Utility
Metrology Sensor, Lithographic Apparatus and Method for Manufacturing Devices
27 May 21
Disclosed is a metrology sensor apparatus comprising: an illumination system operable to illuminate a metrology mark in on a substrate with illumination radiation; an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark; and a wavelength dependent spatial filter for spatially filtering the scattered radiation, the wavelength dependent spatial filter having a spatial profile dependent on the wavelength of the scattered radiation.