78 patents
Page 2 of 4
Utility
Ion Source with Multiple Bias Electrodes
17 Nov 22
An ion source has an arc chamber having first and second ends and an aperture plate to enclose a chamber volume.
Wilhelm Platow, Paul Silverstein, Neil Bassom, Marvin Farley, David Sporleder
Filed: 12 May 21
Utility
Ion Source Repeller
6 Oct 22
An ion source has an arc chamber having one or more arc chamber walls defining and interior region of the arc chamber.
Steven T. Drummond, Neil Colvin, Paul Silverstein
Filed: 6 Apr 21
Utility
Hybrid High-temperature Electrostatic Clamp for Improved Workpiece Temperature Uniformity
12 May 22
A thermal electrostatic clamp has a central electrostatic portion associated with a central region of a workpiece.
Atul Gupta, Scott E Galica
Filed: 10 Nov 21
Utility
Etching Aluminum Nitride or Aluminum Oxide to Generate an Aluminum Ion Beam
5 May 22
An ion implantation system, ion source, and method are provided, where an ion source is configured to ionize an aluminum-based ion source material and to form an ion beam and a by-product including a non-conducting material.
Neil K. Colvin, Neil Bassom, Xiao Xu
Filed: 4 Jun 21
Utility
Hydrogen generator for an ion implanter
15 Mar 22
A terminal for an ion implantation system is provided, wherein the terminal has a terminal housing for supporting an ion source configured to form an ion beam.
Neil K Colvin, Tseh-Jen Hsieh, Richard Rzeszut, Wendy Colby
Filed: 20 Nov 20
Utility
Stepped indirectly heated cathode with improved shielding
8 Feb 22
An ion source for forming a plasma has a cathode with a cavity and a cathode surface defining a cathode step.
Wilhelm Platow, Neil Bassom, Shu Satoh, Paul Silverstein, Marvin Farley
Filed: 26 May 21
Utility
Hydrogen Co-gas When Using a Chlorine-based Ion Source Material
13 Jan 22
An ion implantation system has an aluminum trichloride source material.
Neil K. Colvin, Neil Bassom, Xiangyang Wu
Filed: 4 Jun 21
Utility
Stepped Indirectly Heated Cathode with Improved Shielding
23 Dec 21
An ion source for forming a plasma has a cathode with a cavity and a cathode surface defining a cathode step.
Wilhelm Platow, Neil Bassom, Shu Satoh, Paul Silverstein, Marvin Farley
Filed: 26 May 21
Utility
Tuning Apparatus for Minimum Divergence Ion Beam
23 Dec 21
An ion implantation system has an ion source configured to form an ion beam.
Shu Satoh, Wilhelm Platow
Filed: 15 Jun 21
Utility
Active Workpiece Heating or Cooling for an Ion Implantation System
25 Nov 21
A heated chuck for an ion implantation system selectively clamps a workpiece to a carrier plate having heaters to selectively heat a clamping surface.
Joseph Ferrara, Brian Terry, John Baggett
Filed: 4 Aug 21
Utility
Multiple arc chamber source
23 Nov 21
An ion source for an ion implantation system has a plurality of arc chambers.
Joshua Max Abeshaus, Neil Bassom, Camilla Lambert, Caleb Wisch, Kyle Hinds, Caleb Bell
Filed: 16 Apr 20
Utility
Liquid metal ion source
9 Nov 21
An ion source is configured to form an ion beam and has an arc chamber enclosing an arc chamber environment.
Neil Bassom, Neil Colvin, Tseh-Jen Hsieh, Michael Ameen
Filed: 19 Mar 20
Utility
Scanning magnet design with enhanced efficiency
7 Sep 21
A scanning magnet is positioned downstream of a mass resolving magnet of an ion implantation system and is configured to control a path of an ion beam downstream of the mass resolving magnet for a scanning or dithering of the ion beam.
Bo Vanderberg, Edward Eisner
Filed: 21 Aug 18
Utility
Substrate support having customizable and replaceable features for enhanced backside contamination performance
7 Sep 21
A workpiece support has a support surface where one or more standoffs are selectively removably coupled to the support surface.
John Baggett, Dave Shaner
Filed: 23 Aug 19
Utility
Apparatus and Method for Metal Contamination Control In an Ion Implantation System Using Charge Stripping Mechanism
12 Aug 21
A method for implanting high charge state ions into a workpiece while mitigating trace metal contamination includes generating desired ions at a first charge state from a desired species in an ion source, as well as generating trace metal ions of a contaminant species in a first ion beam.
Causon Ko-Chuan Jen, Shu Satoh, Genise Bonacorsi, William Bintz
Filed: 5 Feb 21
Utility
Hydrogen bleed gas for an ion source housing
13 Jul 21
A terminal system for an ion implantation system has an ion source with a housing and extraction electrode assembly having one or more aperture plates.
Neil K Colvin, Tseh-Jen Hsieh
Filed: 10 May 19
Utility
Scan and corrector magnet designs for high throughput scanned beam ion implanter
15 Jun 21
An ion implantation system and method provide a non-uniform flux of a ribbon ion beam.
Edward Eisner, Bo Vanderberg
Filed: 19 Dec 19
Utility
Wafer soak temperature readback and control via thermocouple embedded end effector for semiconductor processing equipment
18 May 21
A workpiece processing system and method provides an end effector coupled to a workpiece transfer apparatus.
John Baggett
Filed: 20 Dec 18
Utility
Hydrogen Generator for an Ion Implanter
25 Mar 21
A terminal for an ion implantation system is provided, wherein the terminal has a terminal housing for supporting an ion source configured to form an ion beam.
Neil K. Colvin, Tseh-Jen Hsieh, Richard Rzeszut, Wendy Colby
Filed: 20 Nov 20
Utility
Method of Enhancing the Energy and Beam Current on RF Based Implanter
25 Feb 21
Methods and a system of an ion implantation system are configured for increasing beam current above a maximum kinetic energy of a first charge state from an ion source without changing the charge state at the ion source.
Shu Satoh
Filed: 19 Aug 19