78 patents
Page 3 of 4
Utility
In-situ wafer temperature measurement and control
26 Jan 21
A thermal chuck selectively retains a workpiece on a clamping surface.
John F. Baggett, Ronald N. Reece, Petros Miltiades Kopalidis
Filed: 28 Mar 19
Utility
Toxic Outgas Control Post Process
14 Jan 21
A workpiece processing system has a cooling chamber enclosing a chamber volume.
John F. Baggett
Filed: 12 Jul 19
Utility
System and Method for Extending a Lifetime of an Ion Source for Molecular Carbon Implants
9 Dec 20
An ion source assembly and method has a source gas supply to provide a molecular carbon source gas to an ion source chamber.
David Sporleder, Neil Bassom, Neil K. Colvin, Mike Ameen, Xiao Xu
Filed: 28 May 20
Utility
Radiant heating presoak
7 Dec 20
A workpiece processing system and method comprises transferring a workpiece to a vacuum chamber.
John F. Baggett, Billy Benoit
Filed: 15 Jan 18
Utility
Charge Stripping for Ion Implantation Systems
2 Dec 20
An ion implantation system has a source that generates ions from a beam species to form an ion beam, and a mass analyzer mass analyzes the ion beam.
Shu Satoh
Filed: 28 May 20
Utility
Hydrogen generator for an ion implanter
23 Nov 20
A terminal for an ion implantation system is provided, wherein the terminal has a terminal housing for supporting an ion source configured to form an ion beam.
Neil K Colvin, Tseh-Jen Hsieh, Richard Rzeszut, Wendy Colby
Filed: 20 Jan 19
Utility
High throughput serial wafer handling end station
9 Nov 20
An ion implantation apparatus, system, and method are provided for transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber.
Joseph Ferrara, Robert J. Mitchell
Filed: 26 Dec 16
Utility
High Power Wafer Cooling
4 Nov 20
A gas generation system for an ion implantation system has a hydrogen generator configured to generate hydrogen gas within an enclosure.
Joseph Ferrara
Filed: 27 Apr 20
Utility
Multiple Arc Chamber Source
21 Oct 20
An ion source for an ion implantation system has a plurality of arc chambers.
Joshua Max Abeshaus, Neil Bassom, Camilla Lambert, Caleb Wisch, Kyle Hinds, Caleb Bell
Filed: 15 Apr 20
Utility
Shallow angle, multi-wavelength, multi-receiver, adjustable sensitivity aligner sensor for semiconductor manufacturing equipment
5 Oct 20
A workpiece alignment system is provided has a light emission apparatus that directs a light beam at a plurality of wavelengths along a path at a shallow angle toward a first side of a workpiece plane at a peripheral region.
John F. Baggett, Billy Thomas Benoit, Joe Ferrara, Brian Terry
Filed: 24 Oct 18
Utility
Liquid Metal Ion Source
23 Sep 20
An ion source is configured to form an ion beam and has an arc chamber enclosing an arc chamber environment.
Neil Bassom, Neil Colvin, Tseh-Jen Hsieh, Michael Ameen
Filed: 18 Mar 20
Utility
Implantation using solid aluminum iodide (ALI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products
14 Sep 20
An ion implantation system is provided having an ion source configured to form an ion beam from aluminum iodide.
Dennis Elliott Kamenitsa, Richard J. Rzeszut, Fernando M. Silva, Jason R. Beringer, Xiangyang Wu
Filed: 19 Jun 17
Utility
Method of Mixing Upstream and Downstream Current Measurements for Inference of the Beam Current at the Bend of an Optical Element for Realtime Dose Control
19 Aug 20
An ion implantation has an ion source and a mass analyzer configured to form and mass analyze an ion beam.
James DeLuca, Andy Ray, Neil Demario, Rosario Mollica
Filed: 13 Feb 20
Utility
System and method for aligning light-transmitting birefringent workpieces
20 Jul 20
A workpiece alignment system has a light emission apparatus to direct a beam of light toward a first side of a workpiece through a first polarizer apparatus.
Neil James Bassom
Filed: 27 Aug 18
Utility
Ion source with tailored extraction shape
13 Jul 20
An ion implantation system including an ion source for use in creating an ion beam is disclosed.
Patrick T. Heres, Denis A. Robitaille
Filed: 11 Dec 18
Utility
Reduction of condensed gases on chamber walls via heated chamber housing for semiconductor processing equipment
13 Jul 20
A workpiece processing system has a chamber with one or more chamber walls defining surfaces enclosing a chamber volume.
John F. Baggett
Filed: 3 Jan 19
Utility
Reduction of Condensed Gases on Chamber Walls Via Purge Gas Dilution and Evacuation for Semiconductor Processing Equipment
8 Jul 20
A system, method, and apparatus for heating a workpiece in chamber provides one or more surfaces generally enclosing a chamber volume.
John F. Baggett
Filed: 3 Jan 19
Utility
Reduction of Condensed Gases on Chamber Walls Via Heated Chamber Housing for Semiconductor Processing Equipment
8 Jul 20
A workpiece processing system has a chamber with one or more chamber walls defining surfaces enclosing a chamber volume.
John F. Baggett
Filed: 3 Jan 19
Utility
Method for Decreasing Cool Down Time with Heated System for Semiconductor Manufacturing Equipment
24 Jun 20
A system, method, and apparatus for heating and cooling a component in chamber enclosing a chamber volume.
John Baggett, Joseph Ferrara
Filed: 20 Dec 18
Utility
Wafer Soak Temperature Readback and Control Via Thermocouple Embedded End Effector for Semiconductor Processing Equipment
24 Jun 20
A workpiece processing system and method provides an end effector coupled to a workpiece transfer apparatus.
John Baggett
Filed: 19 Dec 18