39 patents
Page 2 of 2
Utility
Method of Enhancing the Energy and Beam Current on RF Based Implanter
25 Feb 21
Methods and a system of an ion implantation system are configured for increasing beam current above a maximum kinetic energy of a first charge state from an ion source without changing the charge state at the ion source.
Shu Satoh
Filed: 19 Aug 19
Utility
Toxic Outgas Control Post Process
14 Jan 21
A workpiece processing system has a cooling chamber enclosing a chamber volume.
John F. Baggett
Filed: 12 Jul 19
Utility
System and Method for Extending a Lifetime of an Ion Source for Molecular Carbon Implants
9 Dec 20
An ion source assembly and method has a source gas supply to provide a molecular carbon source gas to an ion source chamber.
David Sporleder, Neil Bassom, Neil K. Colvin, Mike Ameen, Xiao Xu
Filed: 28 May 20
Utility
Charge Stripping for Ion Implantation Systems
2 Dec 20
An ion implantation system has a source that generates ions from a beam species to form an ion beam, and a mass analyzer mass analyzes the ion beam.
Shu Satoh
Filed: 28 May 20
Utility
High Power Wafer Cooling
4 Nov 20
A gas generation system for an ion implantation system has a hydrogen generator configured to generate hydrogen gas within an enclosure.
Joseph Ferrara
Filed: 27 Apr 20
Utility
Multiple Arc Chamber Source
21 Oct 20
An ion source for an ion implantation system has a plurality of arc chambers.
Joshua Max Abeshaus, Neil Bassom, Camilla Lambert, Caleb Wisch, Kyle Hinds, Caleb Bell
Filed: 15 Apr 20
Utility
Liquid Metal Ion Source
23 Sep 20
An ion source is configured to form an ion beam and has an arc chamber enclosing an arc chamber environment.
Neil Bassom, Neil Colvin, Tseh-Jen Hsieh, Michael Ameen
Filed: 18 Mar 20
Utility
Method of Mixing Upstream and Downstream Current Measurements for Inference of the Beam Current at the Bend of an Optical Element for Realtime Dose Control
19 Aug 20
An ion implantation has an ion source and a mass analyzer configured to form and mass analyze an ion beam.
James DeLuca, Andy Ray, Neil Demario, Rosario Mollica
Filed: 13 Feb 20
Utility
Reduction of Condensed Gases on Chamber Walls Via Purge Gas Dilution and Evacuation for Semiconductor Processing Equipment
8 Jul 20
A system, method, and apparatus for heating a workpiece in chamber provides one or more surfaces generally enclosing a chamber volume.
John F. Baggett
Filed: 3 Jan 19
Utility
Reduction of Condensed Gases on Chamber Walls Via Heated Chamber Housing for Semiconductor Processing Equipment
8 Jul 20
A workpiece processing system has a chamber with one or more chamber walls defining surfaces enclosing a chamber volume.
John F. Baggett
Filed: 3 Jan 19
Utility
Method for Decreasing Cool Down Time with Heated System for Semiconductor Manufacturing Equipment
24 Jun 20
A system, method, and apparatus for heating and cooling a component in chamber enclosing a chamber volume.
John Baggett, Joseph Ferrara
Filed: 20 Dec 18
Utility
Wafer Soak Temperature Readback and Control Via Thermocouple Embedded End Effector for Semiconductor Processing Equipment
24 Jun 20
A workpiece processing system and method provides an end effector coupled to a workpiece transfer apparatus.
John Baggett
Filed: 19 Dec 18
Utility
Scan and Corrector Magnet Designs for High Throughput Scanned Beam Ion Implanter
17 Jun 20
An ion implantation system and method provide a non-uniform flux of a ribbon ion beam.
Edward Eisner, Bo Vanderberg
Filed: 18 Dec 19
Utility
Ion Source with Tailored Extraction Aperture Shape
17 Jun 20
An ion implantation system including an ion source for use in creating an ion beam is disclosed.
Patrick T. Heres, Denis A. Robitaille
Filed: 11 Dec 18
Utility
System and Method for Aligning Light-transmitting Birefringent Workpieces
4 Mar 20
A workpiece alignment system has a light emission apparatus to direct a beam of light toward a first side of a workpiece through a first polarizer apparatus.
Neil James Bassom
Filed: 27 Aug 18
Utility
Scanning Magnet Design with Enhanced Efficiency
26 Feb 20
A scanning magnet is positioned downstream of a mass resolving magnet of an ion implantation system and is configured to control a path of an ion beam downstream of the mass resolving magnet for a scanning or dithering of the ion beam.
Bo Vanderberg, Edward Eisner
Filed: 20 Aug 18
Utility
Substrate Support Having Customizable and Replaceable Features for Enhanced Backside Contamination Performance
26 Feb 20
A workpiece support has a support surface where one or more standoffs are selectively removably coupled to the support surface.
John Baggett, Dave Shaner
Filed: 22 Aug 19
Utility
Hydrogen Bleed Gas for an Ion Source Housing
13 Nov 19
A terminal system for an ion implantation system has an ion source with a housing and extraction electrode assembly having one or more aperture plates.
Neil K. Colvin, Tseh-Jen Hsieh
Filed: 9 May 19
Utility
In-situ Wafer Temperature Measurement and Control
2 Oct 19
A thermal chuck selectively retains a workpiece on a clamping surface.
John F. Baggett, Ronald N. Reece, Petros Miltiades Kopalidis
Filed: 27 Mar 19