39 patents
Utility
Dual source injector with switchable analyzing magnet
21 Nov 23
An ion implantation system has a mass analyzing magnet having interior and exterior region and defining a first entrance, second entrance, and an exit.
Wilhelm Platow, Neil Bassom
Filed: 28 Mar 22
Utility
Extended lifetime dual indirectly-heated cathode ion source
24 Oct 23
An ion source has an arc chamber with a first end and a second end.
Wilhelm Platow, Neil Bassom, Jonathan David
Filed: 30 Sep 21
Utility
System and method for extending a lifetime of an ion source for molecular carbon implants
12 Sep 23
An ion source assembly and method has a source gas supply to provide a molecular carbon source gas to an ion source chamber.
David Sporleder, Neil Bassom, Neil K. Colvin, Mike Ameen, Xiao Xu
Filed: 29 May 20
Utility
Hydraulic feed system for an ion source
15 Aug 23
An ion source has an arc chamber defining an arc chamber volume.
Neil J. Bassom, Joshua Abeshaus, David Sporleder, Neil Colvin, Joseph Valinski, Michael Cristoforo, Vladimir Romanov, Pradeepa Kowrikan Subrahmnya
Filed: 31 Jan 22
Utility
Method for decreasing cool down time with heated system for semiconductor manufacturing equipment
15 Aug 23
A system, method, and apparatus for heating and cooling a component in chamber enclosing a chamber volume.
John Baggett, Joseph Ferrara
Filed: 21 Dec 18
Utility
Etching aluminum nitride or aluminum oxide to generate an aluminum ion beam
11 Jul 23
An ion implantation system, ion source, and method are provided, where an ion source is configured to ionize an aluminum-based ion source material and to form an ion beam and a by-product including a non-conducting material.
Neil K. Colvin, Neil Bassom, Xiao Xu
Filed: 4 Jun 21
Utility
Fluorine based molecular co-gas when running dimethylaluminum chloride as a source material to generate an aluminum ion beam
11 Jul 23
An ion implantation system, ion source, and method are provided having a gaseous aluminum-based ion source material.
Neil K. Colvin, Neil Bassom, Edward Moore
Filed: 29 Oct 21
Utility
Method of mixing upstream and downstream current measurements for inference of the beam current at the bend of an optical element for realtime dose control
9 May 23
An ion implantation has an ion source and a mass analyzer configured to form and mass analyze an ion beam.
James DeLuca, Andy Ray, Neil Demario, Rosario Mollica
Filed: 14 Feb 20
Utility
Ion source with multiple bias electrodes
3 Jan 23
An ion source has an arc chamber having first and second ends and an aperture plate to enclose a chamber volume.
Wilhelm Platow, Paul Silverstein, Neil Bassom, Marvin Farley, David Sporleder
Filed: 12 May 21
Utility
Ion source repeller
6 Dec 22
An ion source has an arc chamber having one or more arc chamber walls defining and interior region of the arc chamber.
Steven T. Drummond, Neil Colvin, Paul Silverstein
Filed: 6 Apr 21
Utility
Hydrogen generator for an ion implanter
15 Mar 22
A terminal for an ion implantation system is provided, wherein the terminal has a terminal housing for supporting an ion source configured to form an ion beam.
Neil K Colvin, Tseh-Jen Hsieh, Richard Rzeszut, Wendy Colby
Filed: 20 Nov 20
Utility
Stepped indirectly heated cathode with improved shielding
8 Feb 22
An ion source for forming a plasma has a cathode with a cavity and a cathode surface defining a cathode step.
Wilhelm Platow, Neil Bassom, Shu Satoh, Paul Silverstein, Marvin Farley
Filed: 26 May 21
Utility
Multiple arc chamber source
23 Nov 21
An ion source for an ion implantation system has a plurality of arc chambers.
Joshua Max Abeshaus, Neil Bassom, Camilla Lambert, Caleb Wisch, Kyle Hinds, Caleb Bell
Filed: 16 Apr 20
Utility
Liquid metal ion source
9 Nov 21
An ion source is configured to form an ion beam and has an arc chamber enclosing an arc chamber environment.
Neil Bassom, Neil Colvin, Tseh-Jen Hsieh, Michael Ameen
Filed: 19 Mar 20
Utility
Scanning magnet design with enhanced efficiency
7 Sep 21
A scanning magnet is positioned downstream of a mass resolving magnet of an ion implantation system and is configured to control a path of an ion beam downstream of the mass resolving magnet for a scanning or dithering of the ion beam.
Bo Vanderberg, Edward Eisner
Filed: 21 Aug 18
Utility
Substrate support having customizable and replaceable features for enhanced backside contamination performance
7 Sep 21
A workpiece support has a support surface where one or more standoffs are selectively removably coupled to the support surface.
John Baggett, Dave Shaner
Filed: 23 Aug 19
Utility
Hydrogen bleed gas for an ion source housing
13 Jul 21
A terminal system for an ion implantation system has an ion source with a housing and extraction electrode assembly having one or more aperture plates.
Neil K Colvin, Tseh-Jen Hsieh
Filed: 10 May 19
Utility
Scan and corrector magnet designs for high throughput scanned beam ion implanter
15 Jun 21
An ion implantation system and method provide a non-uniform flux of a ribbon ion beam.
Edward Eisner, Bo Vanderberg
Filed: 19 Dec 19
Utility
Wafer soak temperature readback and control via thermocouple embedded end effector for semiconductor processing equipment
18 May 21
A workpiece processing system and method provides an end effector coupled to a workpiece transfer apparatus.
John Baggett
Filed: 20 Dec 18
Utility
In-situ wafer temperature measurement and control
26 Jan 21
A thermal chuck selectively retains a workpiece on a clamping surface.
John F. Baggett, Ronald N. Reece, Petros Miltiades Kopalidis
Filed: 28 Mar 19