39 patents
Page 2 of 2
Utility
Radiant heating presoak
7 Dec 20
A workpiece processing system and method comprises transferring a workpiece to a vacuum chamber.
John F. Baggett, Billy Benoit
Filed: 15 Jan 18
Utility
Hydrogen generator for an ion implanter
23 Nov 20
A terminal for an ion implantation system is provided, wherein the terminal has a terminal housing for supporting an ion source configured to form an ion beam.
Neil K Colvin, Tseh-Jen Hsieh, Richard Rzeszut, Wendy Colby
Filed: 20 Jan 19
Utility
High throughput serial wafer handling end station
9 Nov 20
An ion implantation apparatus, system, and method are provided for transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber.
Joseph Ferrara, Robert J. Mitchell
Filed: 26 Dec 16
Utility
Shallow angle, multi-wavelength, multi-receiver, adjustable sensitivity aligner sensor for semiconductor manufacturing equipment
5 Oct 20
A workpiece alignment system is provided has a light emission apparatus that directs a light beam at a plurality of wavelengths along a path at a shallow angle toward a first side of a workpiece plane at a peripheral region.
John F. Baggett, Billy Thomas Benoit, Joe Ferrara, Brian Terry
Filed: 24 Oct 18
Utility
Implantation using solid aluminum iodide (ALI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products
14 Sep 20
An ion implantation system is provided having an ion source configured to form an ion beam from aluminum iodide.
Dennis Elliott Kamenitsa, Richard J. Rzeszut, Fernando M. Silva, Jason R. Beringer, Xiangyang Wu
Filed: 19 Jun 17
Utility
System and method for aligning light-transmitting birefringent workpieces
20 Jul 20
A workpiece alignment system has a light emission apparatus to direct a beam of light toward a first side of a workpiece through a first polarizer apparatus.
Neil James Bassom
Filed: 27 Aug 18
Utility
Ion source with tailored extraction shape
13 Jul 20
An ion implantation system including an ion source for use in creating an ion beam is disclosed.
Patrick T. Heres, Denis A. Robitaille
Filed: 11 Dec 18
Utility
Reduction of condensed gases on chamber walls via heated chamber housing for semiconductor processing equipment
13 Jul 20
A workpiece processing system has a chamber with one or more chamber walls defining surfaces enclosing a chamber volume.
John F. Baggett
Filed: 3 Jan 19
Utility
Film stabilization through novel materials modification of beamline components
22 Jun 20
An electrically conductive component is provided for a near-wafer environment of an ion implantation system, where the component has a carbon-based substrate having a microscopically textured surface overlying a macroscopically textured surface.
David A. Kirkwood, Joseph F. Valinski
Filed: 15 Nov 18
Utility
Method to provide consistent electrostatic clamping through real time control of electrostatic charge deposition in an electrostatic chuck
22 Jun 20
An electrostatic clamp monitoring system has an electrostatic clamp configured to selectively electrostatically clamp a workpiece to a clamping surface associated therewith via one or more electrodes.
Edward K. McIntyre, William P. Reynolds
Filed: 4 Dec 17
Utility
Hydrogen co-gas when using aluminum iodide as an ion source material
8 Jun 20
An ion implantation system is provided having an ion source configured to form an ion beam from aluminum iodide.
Neil Colvin, Tseh-Jen Hsieh, Neil Basson
Filed: 31 May 18
Utility
Low conductance self-shielding insulator for ion implantation systems
8 Jun 20
An insulator for an ion source is positioned between the apertured ground electrode and apertured suppression electrode.
John F. Baggett, Neil Colvin
Filed: 9 Aug 18
Utility
System and method for in-situ beamline film stabilization or removal in the AEF region
2 Mar 20
An ion implantation system has an ion source configured form an ion beam and an angular energy filter (AEF) having an AEF region.
Teng-Chao David Tao, David Allen Kirkwood
Filed: 4 Oct 18
Utility
System for semiconductor wafer retention and sensing in a vacuum load lock
24 Feb 20
A workpiece clamp has a base with first and second sides with a cam ring rotatably coupled to the first side.
Stanley W. Stone
Filed: 27 Nov 16
Utility
Tetrode extraction apparatus for ion source
24 Feb 20
An electrode system for an ion source has a source electrode that defines a source aperture in an ion source chamber, and is coupled to a source power supply.
Wilhelm Platow, Edward Eisner, Bo Vanderberg, Neil Bassom, Michael Cristoforo, Joshua Abeshaus
Filed: 19 Dec 18
Utility
Scan and corrector magnet designs for high throughput scanned beam ion implanter
3 Feb 20
An ion implantation system and method provide a non-uniform flux of a ribbon ion beam.
Edward Eisner, Bo Vanderberg
Filed: 12 Dec 18
Utility
Lanthanated tungsten ion source and beamline components
13 Jan 20
An ion implantation system is provided having one or more conductive components comprised of one or more of lanthanated tungsten and a refractory metal alloyed with a predetermined percentage of a rare earth metal.
Neil K. Colvin, Tseh-Jen Hsieh, Paul B. Silverstein
Filed: 13 Aug 18
Utility
System and method of arc detection using dynamic threshold
23 Dec 19
The present invention is directed to circuits, systems, and methods to quickly to quench an arc that may form between high voltage electrodes associated with an ion source to shorten the duration of the arc and mitigate non-uniform ion implantations.
Yusef Nouri
Filed: 18 Dec 18
Utility
Beam profiling speed enhancement for scanned beam implanters
18 Nov 19
An ion implantation system and method are provided where an ion beam is tuned to a first process recipe.
Andy M. Ray, Edward C. Eisner, Bo H. Vanderberg
Filed: 21 Dec 15