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GRANT
Utility
Flow control system, method, and apparatus
12 Oct 21
A mass flow control apparatus having a monolithic base.
Daniel T. Mudd, Marshall B. Grill, Norman L. Batchelor, II, Sean Penley, Michael Maeder, Patti J. Mudd
Filed: 21 Sep 20
GRANT
Utility
Fluid control system
17 Aug 21
An improved fluid delivery system and method that directly controls the concentration of constituent components in a fluid mixture delivered, for example, to a process chamber.
Philip Ryan Barros, Greg Patrick Mulligan, Chris Melcer
Filed: 19 Feb 18
APP
Utility
Fluid Delivery System
24 Jun 21
A fluid delivery system may include a substrate block having an upper surface; a first substrate port in the upper surface; a second substrate port in the upper surface; a substrate fluid passageway extending between the first substrate port and the second substrate port; a substrate ring defining the second substrate port; and a substrate seal channel formed in the upper surface and surrounding the substrate ring.
Chris MELCER, Philip Ryan BARROS, Haruyuki KUBOTA, Randolph TREUR, Todd CUSHMAN
Filed: 10 Mar 21
APP
Utility
Liquid Delivery System
27 May 21
A fluid delivery system may include a substrate block having an upper surface; a first substrate port in the upper surface; a second substrate port in the upper surface; a substrate fluid passageway extending between the first substrate port and the second substrate port; a substrate ring defining the second substrate port; and a substrate seal channel formed in the upper surface and surrounding the substrate ring.
Chris MELCER, Phillip Ryan BARROS, Haruyuki KUBOTA, Randolph TREUR, Todd CUSHMAN
Filed: 4 Oct 18
APP
Utility
Seal for a Flow Restrictor
11 Feb 21
Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication.
Matthew Eric Kovacic, Zachariah Ezekiel McIntyre, Sean Joseph Penley, Christopher Bryant Davis
Filed: 5 Aug 20
APP
Utility
Laminar Flow Restrictor
11 Feb 21
Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication.
Sean Joseph Penley, Zachariah Ezekiel McIntyre, Tyler James Wright
Filed: 5 Aug 20
APP
Utility
Flow Control System, Method, and Apparatus
6 Jan 21
A mass flow control apparatus having a monolithic base.
Daniel T. Mudd, Marshall B. Grill, Norman L. Batchelor, II, Sean Penley, Michael Maeder, Patti J. Mudd, Zachariah Ezekiel McIntyre, Tyler James Wright, Matthew Eric Kovacic, Christopher Bryant Davis
Filed: 20 Sep 20
APP
Utility
Flow Control System, Method, and Apparatus
23 Dec 20
In one embodiment, a method for delivering a gas at a predetermined rate includes providing a gas flow control apparatus comprising a gas flow path extending from a gas inlet to a gas outlet, a proportional valve coupled to the gas flow path, an on/off valve coupled to the gas flow path, a volume being defined between the proportional valve and the on/off valve, and a flow restrictor having a flow impedance located downstream of the proportional valve.
Daniel T. Mudd, Patti J. Mudd
Filed: 7 Sep 20
GRANT
Utility
Apparatus for splitting flow of process gas and method of operating same
16 Nov 20
Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication.
Sean Penley, Marshall B Grill
Filed: 21 Feb 19
APP
Utility
Method of Achieving Improved Transient Response In Apparatus for Controlling Flow and System for Accomplishing Same
12 Aug 20
Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication.
Sean Penley, Michael Maeder, Daniel T. Mudd, Patti J. Mudd
Filed: 29 Apr 20
GRANT
Utility
Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same
8 Jun 20
Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication.
Sean Penley, Michael Maeder, Daniel T. Mudd, Patti J. Mudd
Filed: 26 Sep 17
GRANT
Utility
Apparatus for controlling flow and method of calibrating same
25 May 20
Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication.
Sean Penley, Michael Maeder
Filed: 28 Dec 17
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