55 patents
Page 3 of 3
Utility
Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic device
11 May 21
The present invention provides a high temperature chemical solution supply system for cleaning substrates.
Fuping Chen, Hui Wang, Xi Wang, Shena Jia, Danying Wang, Chaowei Jiang, Yingwei Dai, Jian Wang
Filed: 9 Dec 15
Utility
Methods and System for Cleaning Semiconductor Wafers
29 Apr 21
A method for cleaning semiconductor substrate without damaging patterned structure on the substrate using ultra/mega sonic device comprising applying liquid into a space between a substrate and an ultra/mega sonic device; setting an ultra/mega sonic power supply at frequency f1 and power P1 to drive said ultra/mega sonic device; before bubble cavitation in said liquid damaging patterned structure on the substrate, setting said ultra/mega sonic power supply at frequency f2 and power P2 to drive said ultra/mega sonic device; after temperature inside bubble cooling down to a set temperature, setting said ultra/mega sonic power supply at frequency f1 and power P1 again; repeating above steps till the substrate being cleaned.
Hui Wang, Fufa Chen, Fuping Chen, Jian Wang, Xi Wang, Xiaoyan Zhang, Yinuo Jin, Zhaowei Jia, Liangzhi Xie, Jun Wang, Xuejun Li
Filed: 4 Jan 21
Utility
Coater with Automatic Cleaning Function and Coater Automatic Cleaning Method
11 Mar 21
A coater with automatic cleaning function and a coater automatic cleaning method.
Hui Wang, Fuping Chen, Wenjun Wang, Hongchao Yang, Voha Nuch, Fufa Chen, Jian Wang, Xiaoyan Zhang, Shu Yang
Filed: 26 Oct 20
Utility
Plating Chuck
4 Mar 21
A plating chuck for holding a substrate during plating processes, wherein the substrate has a notch area (3031) and a patterned region (3032) adjacent to the notch area (3031).
Hui Wang, Jian Wang, Zhaowei Jia, Hongchao Yang
Filed: 7 Sep 17
Utility
Methods and Apparatus for Cleaning Substrates
4 Feb 21
A method and an apparatus for cleaning a substrate are provided.
Hui Wang, Xi Wang, Xiaoyan Zhang, Fufa Chen, Fuping Chen
Filed: 23 Jan 18
Utility
Methods and Apparatus for Cleaning Substrates
4 Feb 21
A substrate (2010, 3010, 4010, 5010, 6010, 7010, 8010) cleaning method is provided, it comprises the steps of: placing a substrate (2010, 3010, 4010, 5010, 6010, 7010, 8010) on a substrate holder (1314); delivering cleaning liquid onto the surface of the substrate (2010, 3010, 4010, 5010, 6010, 7010, 8010); implementing a pre-treatment process to detach bubbles (2050, 2052, 3050, 4050, 5050, 6050, 7052, 70584, 7056, 8052, 8054, 8056) from the surface of the substrate (2010, 3010, 4010, 5010, 6010, 7010, 8010); and then implementing an ultra or mega sonic cleaning process for cleaning the substrate (2010, 3010, 4010, 5010, 6010, 7010, 8010).
Hui Wang, Xi Wang, Xiaoyan Zhang, Fufa Chen
Filed: 23 Jan 18
Utility
Method and apparatus for uniformly metallization on substrate
2 Feb 21
The present invention relates to applying at least one ultra/mega sonic device and its reflection plate for forming standing wave in a metallization apparatus to achieve highly uniform metallic film deposition at a rate far greater than conventional film growth rate in electrolyte.
Hui Wang, Fuping Chen, Xi Wang
Filed: 26 Sep 18
Utility
Methods and system for cleaning semiconductor wafers
2 Feb 21
A method for cleaning semiconductor substrate without damaging patterned structure on the substrate using ultra/mega sonic device comprising applying liquid into a space between a substrate and an ultra/mega sonic device; setting an ultra/mega sonic power supply at frequency f1 and power P1 to drive said ultra/mega sonic device; before bubble cavitation in said liquid damaging patterned structure on the substrate, setting said ultra/mega sonic power supply at frequency f2 and power P2 to drive said ultra/mega sonic device; after temperature inside bubble cooling down to a set temperature, setting said ultra/mega sonic power supply at frequency f1 and power P1 again; repeating above steps till the substrate being cleaned.
Hui Wang, Fufa Chen, Fuping Chen, Jian Wang, Xi Wang, Xiaoyan Zhang, Yinuo Jin, Zhaowei Jia, Liangzhi Xie, Jun Wang, Xuejun Li
Filed: 20 May 15
Utility
Functional Water Producing Apparatus and Functional Water Producing Method
11 Nov 20
A functional water producing apparatus in an embodiment includes: a water pressure regulator configured to regulate the water pressure of the ultrapure water, the water pressure regulator having a pressure regulating valve configured to regulate a water pressure of the ultrapure water to an almost constant pressure and a feed water pump configured to pressurize the ultrapure water; a dissolving device configured to dissolve functional gas imparting a specific function in the ultrapure water regulated the water pressure by the water pressure regulator; and a control device configured to control the feed water pump to regulate the water pressure of the functional water to a predetermined constant pressure based on a water pressure or a flow rate of the functional water flowing out of the dissolving device.
Takayuki JIZAIMARU, David Hui WANG
Filed: 6 Apr 20
Utility
Plating Apparatus
11 Nov 20
A plating apparatus for depositing metal on a substrate, comprising a membrane frame (14), a catholyte inlet pipe (30) and a center cap (40).
Zhaowei Jia, Hongchao Yang, Chenhua Lu, Jian Wang, Hui Wang
Filed: 29 Aug 17
Utility
Coater with automatic cleaning function and coater automatic cleaning method
26 Oct 20
A coater with automatic cleaning function and a coater automatic cleaning method.
Hui Wang, Fuping Chen, Wenjun Wang, Hongchao Yang, Voha Nuch, Fufa Chen, Jian Wang, Xiaoyan Zhang, Shu Yang
Filed: 15 Sep 14
Utility
Methods and Apparatus for Cleaning Semiconductor Wafers
21 Oct 20
A method for cleaning semiconductor substrate (1010,2010) without damaging patterned structure on the semiconductor substrate (1010,2010) using ultra/mega sonic device (1003,2003) comprises applying liquid into a space between a substrate (1010,2010) and an ultra/mega sonic device (1003,2003); setting an ultra/mega sonic power supply at frequency f1 and power P1 to drive the ultra/mega sonic device (1003,2003); before bubble cavitation in the liquid damaging patterned structure on the substrate (1010,2010), setting the ultra/mega sonic power supply at zero output;after temperature inside bubble cooling down to a set temperature, setting the ultra/mega sonic power supply at frequency f1 and power P1 again; detecting power on time at power P1 and frequency f1 and power off time separately or detecting amplitude of each waveform output by the ultra/mega sonic power supply; comparing the detected power on time with a preset time τ1, or comparing the detected power off time with a preset time τ2, or comparing detected amplitude of each waveform with a preset value, if the detected power on time is longer than the preset time τ1, or the detected power off time is shorter than the preset time τ2, or the detected amplitude of any waveform is larger than the preset value, shut down the ultra/mega sonic power supply and send out an alarm signal.
Jun Wang, Hui Wang, Fufa Chen, Fuping Chen, Jian Wang, Xi Wang, Xiaoyan Zhang, Yinuo Jin, Zhaowei Jia, Liangzhi Xie, Xuejun Li
Filed: 5 Apr 16
Utility
Substrate Heat Treatment Apparatus
16 Sep 20
A substrate heat treatment apparatus for heat treating a substrate, comprising a bake plate, a plurality of support components, a baffle plate, and a driving device.
Hui Wang, Hongchao Yang, Jun Wu, Wenjun Wang, Fuping Chen, Zhiyou Fang
Filed: 17 Mar 16
Utility
Substrate supporting apparatus
7 Sep 20
A substrate supporting apparatus (300) for cleaning a back side of a substrate (107) is provided.
Fufa Chen, Zhiyou Fang, Jun Wu, Hui Wang, Fuping Chen, Wenjun Wang
Filed: 5 Jul 16
Utility
Fall-proof apparatus for cleaning semiconductor devices and a chamber with the apparatus
7 Sep 20
A fall-proof apparatus for cleaning semiconductor devices is provided.
Zhenming Chu, Xi Wang, Hui Wang, Shena Jia, Jun Wu, Fuping Chen, Xuejun Li
Filed: 7 Sep 15