35 patents
Utility
Methods for Thermal Treatment of Substrates
30 Nov 23
In the thermal treatment of substrates, a susceptor is used to hold at least one substrate.
Peter Sebald LAUFFER
Filed: 10 Aug 23
Utility
Method for Emissivity-corrected Pyrometry
23 Nov 23
A substrate is coated with a multilayer structure which has layers of a first portion and layers of a second portion that are deposited on the layers of the first portion.
Karsten ROJEK, Dirk HEYDHAUSEN
Filed: 5 Oct 21
Utility
Method for Using Shield Plate In a CVD Reactor
9 Nov 23
A CVD reactor includes a gas inlet member having a circular outline, and a susceptor that can be heated by a heating device.
Adam BOYD, Wilhelm Josef Thomas KRÜCKEN, Honggen JIANG, Fred Michael Andrew CRAWLEY
Filed: 19 Jul 23
Utility
CVD Reactor with Temperature-controllable Gas Inlet Region
19 Oct 23
A CVD reactor includes a reactor housing, a susceptor that forms a floor of a process chamber, a gas inlet member with at least one gas inlet region, a heating device arranged under the susceptor for producing a difference in temperature between the main body of the susceptor and a ceiling of the process chamber, substrate carriers located at a distance from the gas inlet member in a direction of flow, and flow zone plates arranged between the gas inlet member and each of the substrate carriers.
Philip HENS
Filed: 31 Aug 21
Utility
Gas Inlet Element of a CVD Reactor with Two Infeed Points
12 Oct 23
In a device and a method for depositing at least one layer on at least one substrate, a first gas flow comprising a reactive gas is fed through a first gas inlet opening, and a second gas flow is fed through a second gas inlet opening, into at least one gas distribution volume of a gas inlet element.
Adam BOYD
Filed: 2 Sep 21
Utility
Method for Identifying Substrates Which Are Faulty or Have Been Incorrectly Inserted into a CVD Reactor
21 Sep 23
With the aid of one or more optical sensors, substrates which are faulty or have been incorrectly inserted in a CVD reactor are identified.
Utz Herwig HAHN, Martin DAUELSBERG, Thomas SCHMITT
Filed: 20 Jul 21
Utility
Shield plate for a CVD reactor
5 Sep 23
A CVD reactor includes a gas inlet member having a circular outline, and a susceptor that can be heated by a heating device.
Adam Boyd, Wilhelm Josef Thomas Krücken, Honggen Jiang, Fred Michael Andrew Crawley
Filed: 22 Oct 19
Utility
Device and method for controlling the ceiling temperature of a CVD reactor
1 Aug 23
A CVD reactor may include a susceptor, process chamber and heat dissipation body.
Peter Sebald Lauffer
Filed: 3 Sep 19
Utility
Closure element for closing a loading opening of an inner housing of a CVD reactor
18 Jul 23
A CVD reactor includes a gas-tight and evacuatable reactor housing and an inner housing arranged therein.
Marcel Kollberg, Francisco Ruda Y Witt, Mike Pfisterer
Filed: 2 Oct 18
Utility
Device and Method for Evaporating an Organic Powder
13 Jul 23
In a method for evaporating a non-gaseous starting material, the starting material is introduced into an evaporation chamber; an evaporation element heats the starting material to create a vapor; a conveying gas flow transports the vapor through a conveying channel and past a sensor, which measures the concentration or partial pressure of the vapor in the gas flow flowing through the conveying channel; and the mass flow of the vapor through the conveying channel is controlled by varying the conveying gas flow with respect to a setpoint value.
Markus JAKOB, Andy EICHLER
Filed: 16 Jun 21
Utility
Method for Ascertaining the End of a Cleaning Process for a Process Chamber of a Mocvd Reactor
25 May 23
In a cleaning process for removing parasitic depositions on surfaces of a process chamber of a CVD reactor, a susceptor of the CVD reactor is heated by a heating device, and the susceptor is regulated to a specified temperature or is heated with a constant heat output.
Utz Herwig HAHN, Martin EICKELKAMP, Dirk FAHLE
Filed: 17 Mar 21
Utility
CVD Reactor and Method for Controlling the Surface Temperature of the Substrates
9 Feb 23
In a CVD reactor and a method for the open-loop/closed-loop control of the surface temperature of substrates arranged therein, the substrates lie on substrate-retaining elements, which are each supported by a gas cushion.
Ralf LEIERS
Filed: 5 Jan 21
Utility
Gas Inlet Device for a CVD Reactor
5 Jan 23
A gas distribution device has a plurality of gas inlet regions that are arranged above each other and can be adjusted by switching on or off respective valves.
Martin EICKELKAMP
Filed: 1 Dec 20
Utility
Use of a CVD Reactor for Depositing Two-dimensional Layers
5 Jan 23
A two-dimensional layer is deposited onto a substrate in a CVD reactor, in which a process gas is fed into a process chamber.
Kenneth B. K. TEO, Clifford MCALEESE, Ben Richard CONRAN
Filed: 30 Oct 20
Utility
Method for Depositing a Two-dimensional Coating and CVD Reactor
22 Dec 22
A coating is deposited on a substrate in a CVD reactor that includes a process chamber and a gas inlet member with a first gas distribution chamber and a second gas distribution chamber separate from the first gas distribution chamber.
Kenneth B. K. TEO, Clifford MCALEESE, Ben Richard CONRAN
Filed: 30 Oct 20
Utility
Wall-cooled Gas-inlet Element for a CVD Reactor
15 Dec 22
A gas inlet element for a CVD reactor includes a cylindrical main body, which together with an outer wall, forms a gas outlet face.
Marcel KOLLBERG, Benjamin David WRIGHT, Merim MUKINOVIC, Barry O'NEIL, Marc PLUMMER
Filed: 17 Nov 20
Utility
Method and Apparatus for Depositing Organic Layers
1 Dec 22
An apparatus for depositing organic layers on a substrate includes a gas-mixing device with one or more inlets, each for supplying a gas flow consisting of previously vaporized organic molecules that are conveyed by a carrier gas and have a molar mass greater than 300 g/mol or 400 g/mol, gas diversion elements which homogeneously mix the organic molecules in the carrier gas, and an outlet from which a homogeneous gas mixture discharges.
Hermann Albert GIESE, Alexander GEORGI, Jan Raphael BINDEL, Dinesh Kanna SUBRAMANIAM, Tobias SCHÄFER, Dietmar KEIPER, Olaf Martin WURZINGER
Filed: 28 Oct 20
Utility
Substrate holder arrangement with mask support
25 Oct 22
A device for depositing a layer, which has been structured by the application of a mask, on a substrate, includes an adjusting device for adjusting the position of a mask support with respect to a support frame.
Markus Jakob, Wilhelmus Janssen, Steffen Neumann, Jaap Oudes
Filed: 12 Mar 18
Utility
Method and Device for Forming Bundles of Nanofilaments
29 Sep 22
A device can be used as an electrode for a lithium-ion battery.
Bernd SCHINELLER, Kenneth B. K. TEO, Nalin Lalith RUPESINGHE
Filed: 3 Jun 22
Utility
Susceptor for a CVD reactor
13 Sep 22
A susceptor for a CVD reactor includes a flat circular disc-shaped body with channels that are arranged on a broad side of the disc-shaped body within one or more circular surface sections extending on a plane in order to transfer heat to a substrate holder.
Oliver Schön, Francisco Ruda Y Witt, Marcus Schaffrath
Filed: 6 Mar 18