35 patents
Page 2 of 2
Utility
Gas-inlet Element for a CVD Reactor
18 Aug 22
A gas outlet surface of a gas inlet element for a CVD reactor or a gas outlet surface of a shielding plate for a gas inlet element has a multiplicity of gas outlet openings arranged around a center of the gas outlet surface.
Oliver SCHÖN
Filed: 10 Jul 20
Utility
Device for separating a structured layer on a substrate, and method for setting up the device
26 Jul 22
A device for depositing a layer on a substrate, while a mask is placed on the substrate, includes an adjustment device for adjusting the position of a mask carrier with respect to a support frame.
Jaap Oudes, Markus Jakob, Wilhelmus Janssen, Vladimirs Leontjevs
Filed: 12 Mar 18
Utility
Method for Depositing a Semiconductor Layer System, Which Contains Gallium and Indium
30 Jun 22
In a method for depositing semiconductor layers, a first process step is performed to deposit a layer containing gallium and a second process step is performed to deposit a layer containing indium.
Adam BOYD
Filed: 5 May 20
Utility
Susceptor Arrangement of a CVD Reactor
16 Jun 22
A susceptor arrangement for use in a CVD reactor includes a circular or annular susceptor with a first susceptor broad side, on which a substrate holder and at least one coveting element are arranged.
Francisco RUDA Y WITT, Marcel KOLLBERG, Hendrik RAUF
Filed: 28 Feb 20
Utility
Method for Recording a State of a CVD Reactor Under Production Conditions
16 Jun 22
During a process involving one or more process steps of a process phase, in which a substrate is located in the process chamber of a CVD reactor, a process temperature and a pressure are each set and a process gas flow is fed into the process chamber by way of control data delivered by a controller in accordance with a formula stored in the controller.
Pascal TILLMANNS, Oliver SCHÖN, Thomas SCHMITT, Peter Sebald LAUFFER
Filed: 20 Mar 20
Utility
Apparatus for deposition of a III-V semiconductor layer
29 Mar 22
A III-V semiconductor layer is deposited using an apparatus comprising a process chamber, a susceptor for receiving one or more substrates to be coated, and a gas inlet element which comprises a plurality of process gas inlet zones.
Francisco Ruda Y Witt, Markus Deufel, Marcel Kollberg
Filed: 15 May 19
Utility
Susceptor of a CVD Reactor
10 Mar 22
A susceptor for a CVD reactor includes a bearing surface for supporting a substrate holder.
Wilhelm Josef Thomas KRÜCKEN, Peter Sebald LAUFFER
Filed: 6 Dec 19
Utility
Device and method for determining the concentration of a vapor
8 Mar 22
A device for determining the partial pressure or the concentration of a steam in a volume, includes a sensor body that can be oscillated.
Arno Offermanns, Robert Bartholomeus Jacques Oligschlaeger
Filed: 22 Mar 18
Utility
Nucleation Layer Deposition Method
17 Feb 22
A nucleation layer comprised of group III and V elements is directly deposited onto the surface of a substrate made of a group IV element.
Christof Martin MAUDER
Filed: 10 Apr 19
Utility
Method for Producing a Component Part of a CVD Reactor
3 Feb 22
A component made of a quartz blank is used as a component part of a CVD reactor.
Marcel KOLLBERG, Francisco RUDA Y WITT
Filed: 27 Nov 19
Utility
Shield Plate for a CVD Reactor
6 Jan 22
A CVD reactor includes a gas inlet member having a circular outline, and a susceptor that can be heated by a heating device.
Adam BOYD, Wilhelm Josef Thomas KRÜCKEN, Honggen JIANG, Fred Michael Andrew CRAWLEY
Filed: 22 Oct 19
Utility
Device and method for determining the concentration of a vapor
30 Nov 21
A device for determining the partial pressure or concentration of a vapor in a volume includes a sensor element that can be caused to oscillate and temperature-controlled to a temperature below the condensation temperature of the vapor.
Michael Long
Filed: 22 Mar 18
Utility
Susceptor for a chemical vapour deposition reactor
9 Nov 21
A susceptor for a CVD-reactor includes insertion openings arranged in a bearing surface of the susceptor.
Daniel Claessens, Adam Boyd, James O'Dowd, Olivier Feron
Filed: 22 Aug 17
Utility
Device and Method for Controlling the Ceiling Temperature of a CVD Reactor
7 Oct 21
A CVD reactor may include a susceptor, process chamber and heat dissipation body.
Peter Sebald LAUFFER
Filed: 3 Sep 19
Utility
Electrode for a Lithium-ion Battery and Device and Method for Producing Said Electrode
23 Sep 21
A device can be used as an electrode for a lithium-ion battery.
Bernd SCHINELLER, Kenneth B. K. TEO, Nalin Lalith RUPESINGHE
Filed: 25 Sep 17