10 patents
Utility
Shield plate for a CVD reactor
5 Sep 23
A CVD reactor includes a gas inlet member having a circular outline, and a susceptor that can be heated by a heating device.
Adam Boyd, Wilhelm Josef Thomas Krücken, Honggen Jiang, Fred Michael Andrew Crawley
Filed: 22 Oct 19
Utility
Device and method for controlling the ceiling temperature of a CVD reactor
1 Aug 23
A CVD reactor may include a susceptor, process chamber and heat dissipation body.
Peter Sebald Lauffer
Filed: 3 Sep 19
Utility
Closure element for closing a loading opening of an inner housing of a CVD reactor
18 Jul 23
A CVD reactor includes a gas-tight and evacuatable reactor housing and an inner housing arranged therein.
Marcel Kollberg, Francisco Ruda Y Witt, Mike Pfisterer
Filed: 2 Oct 18
Utility
Substrate holder arrangement with mask support
25 Oct 22
A device for depositing a layer, which has been structured by the application of a mask, on a substrate, includes an adjusting device for adjusting the position of a mask support with respect to a support frame.
Markus Jakob, Wilhelmus Janssen, Steffen Neumann, Jaap Oudes
Filed: 12 Mar 18
Utility
Susceptor for a CVD reactor
13 Sep 22
A susceptor for a CVD reactor includes a flat circular disc-shaped body with channels that are arranged on a broad side of the disc-shaped body within one or more circular surface sections extending on a plane in order to transfer heat to a substrate holder.
Oliver Schön, Francisco Ruda Y Witt, Marcus Schaffrath
Filed: 6 Mar 18
Utility
Device for separating a structured layer on a substrate, and method for setting up the device
26 Jul 22
A device for depositing a layer on a substrate, while a mask is placed on the substrate, includes an adjustment device for adjusting the position of a mask carrier with respect to a support frame.
Jaap Oudes, Markus Jakob, Wilhelmus Janssen, Vladimirs Leontjevs
Filed: 12 Mar 18
Utility
Apparatus for deposition of a III-V semiconductor layer
29 Mar 22
A III-V semiconductor layer is deposited using an apparatus comprising a process chamber, a susceptor for receiving one or more substrates to be coated, and a gas inlet element which comprises a plurality of process gas inlet zones.
Francisco Ruda Y Witt, Markus Deufel, Marcel Kollberg
Filed: 15 May 19
Utility
Device and method for determining the concentration of a vapor
8 Mar 22
A device for determining the partial pressure or the concentration of a steam in a volume, includes a sensor body that can be oscillated.
Arno Offermanns, Robert Bartholomeus Jacques Oligschlaeger
Filed: 22 Mar 18
Utility
Device and method for determining the concentration of a vapor
30 Nov 21
A device for determining the partial pressure or concentration of a vapor in a volume includes a sensor element that can be caused to oscillate and temperature-controlled to a temperature below the condensation temperature of the vapor.
Michael Long
Filed: 22 Mar 18
Utility
Susceptor for a chemical vapour deposition reactor
9 Nov 21
A susceptor for a CVD-reactor includes insertion openings arranged in a bearing surface of the susceptor.
Daniel Claessens, Adam Boyd, James O'Dowd, Olivier Feron
Filed: 22 Aug 17
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