360 patents
Page 12 of 18
Utility
Method of measuring misregistration of semiconductor devices
23 Feb 21
A method of measuring misregistration in the manufacture of semiconductor devices including providing a multilayered semiconductor device, using a scatterometry metrology tool to perform misregistration measurements at multiple sites on the multilayered semiconductor device, receiving raw misregistration data for each of the misregistration measurements, thereafter providing filtered misregistration data by removing outlying raw misregistration data points from the raw misregistration data for each of the misregistration measurements, using the filtered misregistration data to model misregistration for the multilayered semiconductor device, calculating correctables from the modeled misregistration for the multilayered semiconductor device, providing the correctables to the scatterometry metrology tool, thereafter recalibrating the scatterometry metrology tool based on the correctables and measuring misregistration using the scatterometry metrology tool following the recalibration.
Roie Volkovich, Ido Dolev
Filed: 12 Apr 19
Utility
Die screening using inline defect information
23 Feb 21
Embodiments herein include methods, systems, and apparatuses for die screening using inline defect information.
Alex Teng Song Lim, Ganesh Meenakshisundaram
Filed: 12 Jun 19
Utility
Three-dimensional calibration structures and methods for measuring buried defects on a three-dimensional semiconductor wafer
23 Feb 21
A three-dimensional calibration structure for measuring buried defects on a semiconductor device is disclosed.
Philip Measor, Robert M. Danen
Filed: 4 Dec 17
Utility
Correlating SEM and optical images for wafer noise nuisance identification
16 Feb 21
Disclosed are apparatus and methods for inspecting a sample.
Qiang Zhang, Grace H. Chen
Filed: 28 May 20
Utility
System, method and apparatus for polarization control
16 Feb 21
A polarization control device includes a first wave plate having a first surface profile and a second wave plate having a second surface profile complementary to the first surface profile.
Ivan Maleev, Donald Pettibone
Filed: 11 Jun 18
Utility
Multi-pass imaging using image sensors with variably biased channel-stop contacts for identifying defects in a semiconductor die
16 Feb 21
First and second images of a semiconductor die or portion thereof are generated.
Tzi-Cheng Lai, Jehn-Huar Chem, Stephen Biellak
Filed: 15 Mar 19
Utility
Laser marking focus feedback system having an intensity indication of reflected radiation passed through an objective lens, a beam splitter and a pinhole
9 Feb 21
A method of focusing includes irradiating an object by directing radiation output by a radiating source through an objective lens, measuring a first intensity of reflected radiation that is reflected from the object, adjusting a distance between the objective lens and the object, measuring a second intensity of reflected radiation, and analyzing the first intensity of reflected radiation and the second intensity of reflected radiation to determine a focal distance between the objective lens and the object.
Timothy Russin, Shiyu Zhang, Charles Amsden, Daniel Kapp
Filed: 9 Aug 18
Utility
Microneedles
26 Jan 21
A method is for manufacturing a plurality of silicon microneedles which have a bevelled tip.
Kerry Roberts, Huma Ashraf, Pey Fen Eng
Filed: 15 Jun 18
Utility
Apparatus and method for controlled application of reactive vapors to produce thin films and coatings
26 Jan 21
An apparatus for vapor deposition of thin film coatings, including: a process controller; a plurality of precursor containers into which a plurality of coating precursors, each in the form of a liquid or a solid, are respectively placed; a plurality of precursor vapor reservoirs, each in communication with a respective one of said precursor containers; a plurality of in-line devices which control a vapor flow of a coating precursor vapor from one of said precursor containers into one of said precursor vapor reservoirs with which said precursor container is in communication upon receipt of a signal from said process controller; a plurality of precursor control valves which control vapor flow from said precursor vapor reservoir upon receipt of a signal from said process controller; and a process chamber for vapor deposition of said coating on a substrate when present in said process chamber.
Boris Kobrin, Romuald Nowak, Richard C. Yi, Jeffrey D. Chinn
Filed: 8 Aug 17
Utility
Method and apparatus for depositing a material
26 Jan 21
A method is for depositing a dielectric material on to a substrate in a chamber by pulsed DC magnetron sputtering with a pulsed DC magnetron device which produces one or more primary magnetic fields.
Stephen R Burgess, Rhonda Hyndman, Amit Rastogi, Eduardo Paulo Lima, Clive L Widdicks, Paul Rich, Scott Haymore, Daniel Cook
Filed: 30 Mar 16
Utility
Determining the impacts of stochastic behavior on overlay metrology data
26 Jan 21
Methods are provided for designing metrology targets and estimating the uncertainty error of metrology metric values with respect to stochastic noise such as line properties (e.g., line edge roughness, LER).
Evgeni Gurevich, Michael E. Adel, Roel Gronheid, Yoel Feler, Vladimir Levinski, Dana Klein, Sharon Aharon
Filed: 27 Feb 18
Utility
In-situ temperature sensing substrate, system, and method
26 Jan 21
A sensor for detecting a temperature distribution imparted on a substrate in an environment is disclosed.
Earl Jensen
Filed: 17 Jul 18
Utility
Creating and tuning a classifier to capture more defects of interest during inspection
26 Jan 21
Defects of interest can be captured by a classifier.
Erfan Soltanmohammadi, Martin Plihal, Tai-Kam Ng, Sang Hyun Lee
Filed: 13 Nov 18
Utility
Image sensors with grounded or otherwise biased channel-stop contacts
26 Jan 21
A back-illuminated image sensor includes a first pixel, a second pixel, and a channel stop situated between the first pixel and the second pixel to isolate the first pixel from the second pixel.
Tzi-Cheng Lai, Jehn-Huar Chern, Stephen Biellak
Filed: 5 Oct 18
Utility
Systems and methods for combined x-ray reflectometry and photoelectron spectroscopy
19 Jan 21
Methods and systems for measuring structural and material characteristics of semiconductor structures based on combined x-ray reflectometry (XRR) and x-ray photoelectron spectroscopy (XPS) are presented herein.
Andrei V. Shchegrov, Alexander Kuznetsov, Oleg Khodykin
Filed: 21 Dec 18
Utility
Direct focusing with image binning in metrology tools
19 Jan 21
Focusing methods and modules are provided for metrology tools and systems.
Nadav Gutman, Boris Golovanevsky, Noam Gluzer
Filed: 25 Aug 17
Utility
Data-driven Misregistration Parameter Configuration and Measurement System and Method
14 Jan 21
A data-driven misregistration parameter configuration and measurement system and method including simulating a plurality of measurement simulations of at least one multilayered semiconductor device, selected from a batch of multilayered semiconductor devices intended to be identical, using sets of measurement parameter configurations, generating simulation data for the device, identifying recommended measurement parameter configurations, selected from sets of measurement parameter configurations, providing a multilayered semiconductor device selected from the batch, providing the at least one recommended set of measurement parameter configurations to a misregistration metrology tool having multiple possible sets of measurement parameter configurations, measuring at least one multilayered semiconductor device, selected from the batch using the recommended set, thereby generating measurement data for the device, thereafter identifying a final recommended set of measurement parameter configurations and measuring misregistration of at least one multilayered semiconductor device, selected from the batch, using the final recommended set.
Shlomit Katz, Roie Volkovich, Anna Golotsvan, Raviv Yohanan
Filed: 10 Jul 19
Utility
Laser produced plasma light source having a target material coated on a cylindrically-symmetric element
12 Jan 21
The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum.
Alexey Kuritsyn, Brian Ahr, Rudy F. Garcia, Frank Chilese, Oleg Khodykin
Filed: 9 Jul 18
Utility
Overlay targets with orthogonal underlayer dummyfill
12 Jan 21
The disclosure is directed to designing and using an overlay target with orthogonal underlayer dummyfill.
Nuriel Amir, Guy Cohen, Vladimir Levinski, Michael Adel
Filed: 21 May 13
Utility
Deposition Apparatus
6 Jan 21
A magnetron sputtering apparatus for depositing material onto a substrate, comprises: a chamber comprising a substrate support and a target; a plasma production device configured to produce a plasma within the chamber suitable for sputtering material from the target onto the substrate; and a thermally conductive grid comprising a plurality of cells.
Rhonda Hyndman, Steve Burgess
Filed: 30 Jun 20