98 patents
Page 5 of 5
Utility
Collecting and Recycling Rare Gases In Semiconductor Processing Equipment
16 Sep 20
A process chamber, such as for semiconductor processing equipment, is connected with a recovery unit.
Chao Chang, Michael Friedmann
Filed: 9 Mar 20
Utility
Multi-Dimensional Model Of Optical Dispersion
16 Sep 20
Methods and systems for estimating values of parameters of interest from optical measurements of a sample early in a production flow based on a multidimensional optical dispersion (MDOD) model are presented herein.
Natalia Malkova, Mikhail Sushchik, Dawei Hu, Carlos L. Ygartua
Filed: 10 Mar 20
Utility
Methods And Systems For Measurement Of Thick Films And High Aspect Ratio Structures
9 Sep 20
Methods and systems for performing spectroscopic measurements of semiconductor structures including ultraviolet, visible, and infrared wavelengths greater than two micrometers are presented herein.
Noam Sapiens, Shankar Krishnan, David Y. Wang, Alexander Buettner, Kerstin Purrucker, Kevin A. Peterlinz
Filed: 19 May 20
Utility
Dynamic Amelioration of Misregistration Measurement
9 Sep 20
A dynamic misregistration measurement amelioration method including taking at least one misregistration measurement at multiple sites on a first semiconductor device wafer, which is selected from a batch of semiconductor device wafers intended to be identical, analyzing each of the misregistration measurements, using data from the analysis of each of the misregistration measurements to determine ameliorated misregistration measurement parameters at each one of the multiple sites, thereafter ameliorating misregistration metrology tool setup for ameliorated misregistration measurement at the each one of the multiple sites, thereby generating an ameliorated misregistration metrology tool setup and thereafter measuring misregistration at multiple sites on a second semiconductor device wafer, which is selected from the batch of semiconductor device wafers intended to be identical, using the ameliorated misregistration metrology tool setup.
Roie Volkovich, Anna Golotsvan, Eyal Abend
Filed: 18 May 19
Utility
Photocathode Emitter System That Generates Multiple Electron Beams
2 Sep 20
The system includes a photocathode electron source, diffractive optical element, and a microlens array to focus the beamlets.
Gildardo R. Delgado, Katerina Ioakeimidi, Rudy Garcia, Zefram Marks, Gary V. Lopez Lopez, Frances A. Hill, Michael E. Romero
Filed: 20 Aug 18
Utility
Probe for Testing an Electrical Property of a Test Sample
2 Sep 20
A probe for direct nano- and micro-scale electrical characterization of materials and semi conductor wafers.
Frederik Westergaard Østerberg, Dirch Hjorth Petersen, Henrik Hartmann Henrichsen, Alberto Cagliani, Ole Hansen, Peter Folmer Nielsen
Filed: 14 Nov 18
Utility
Variable Aperture Mask
26 Aug 20
A collection system of a semiconductor metrology tool includes a chuck to support a target from which an optical beam is reflected and a spectrometer to receive the reflected optical beam.
Barry Blasenheim, Noam Sapiens, Michael Friedmann, Pablo Rovira
Filed: 11 May 20
Utility
Visualization of Three-Dimensional Semiconductor Structures
26 Aug 20
A semiconductor metrology tool inspects an area of a semiconductor wafer.
Aaron J. Rosenberg, Jonathan Iloreta, Thaddeus G. Dziura, Antonio Gellineau, Yin Xu, Kaiwen Xu, John Hench, Abhi Gunde, Andrei Veldman, Liequan Lee, Houssam Chouaib
Filed: 21 Feb 19
Utility
Method of Measuring Misregistration of Semiconductor Devices
26 Aug 20
A method of measuring misregistration in the manufacture of semiconductor devices including providing a multilayered semiconductor device, using a scatterometry metrology tool to perform misregistration measurements at multiple sites on the multilayered semiconductor device, receiving raw misregistration data for each of the misregistration measurements, thereafter providing filtered misregistration data by removing outlying raw misregistration data points from the raw misregistration data for each of the misregistration measurements, using the filtered misregistration data to model misregistration for the multilayered semiconductor device, calculating correctables from the modeled misregistration for the multilayered semiconductor device, providing the correctables to the scatterometry metrology tool, thereafter recalibrating the scatterometry metrology tool based on the correctables and measuring misregistration using the scatterometry metrology tool following the recalibration.
Roie VOLKOVICH, Ido DOLEV
Filed: 11 Apr 19
Utility
Reference Image Generation for Semiconductor Applications
26 Aug 20
Methods and systems for generating a reference image for use in a process performed for a specimen are provided.
Fang Lei
Filed: 18 Feb 20
Utility
System and Method for Pumping Laser Sustained Plasma with Interlaced Pulsed Illumination Sources
26 Aug 20
A system for pumping laser sustained plasma is disclosed.
Ilya Bezel, Matthew Derstine, William Schumaker, Michael Friedmann
Filed: 13 Feb 20
Utility
Air Scattering Standard for Light Scattering Based Optical Instruments and Tools
19 Aug 20
An inspection system utilizing an air scatter standard includes one or more illumination sources to generate a beam of illumination, illumination optics configured to focus the beam of illumination into a volume of air contained within a chamber of an inspection chamber, one or more collection optics configured to collect a portion of illumination scattered from the volume of air, a detector configured to receive the collected portion of illumination from the one or more collection optics, a controller including one or more processors, communicatively coupled to the detector, configured to execute a set of program instructions to receive one or more signals from the detector and determine a state of the beam of illumination at one or more times based on a comparison between at least one of the intensity or polarization of the illumination scattered from the volume of air and a predetermine air scatter standard.
Frank Li, Qing Li, Zhiwei Xu
Filed: 18 Feb 19
Utility
Sensitive Particle Detection with Spatially-Varying Polarization Rotator and Polarizer
19 Aug 20
A dark-field inspection system may include an illumination source to generate an illumination beam, illumination optics configured to direct the illumination beam to a sample at an off-axis angle along an illumination direction, collection optics to collect scattered light from the sample in response to the illumination beam in a dark-field mode, a polarization rotator located at a pupil plane of the one or more collection optics, where the polarization rotator provides a spatially-varying polarization rotation angle selected to rotate light scattered from a surface of the sample to a selected polarization angle, a polarizer aligned to reject light polarized along the selected polarization angle to reject the light scattered from a surface of the sample, and a detector to generate a dark-field image of the sample based on scattered light from the sample passed by the polarizer.
Xuefeng Liu, Jenn-Kuen Leong, Daniel Kavaldjiev, John Fielden
Filed: 19 Sep 19
Utility
Design File Selection for Test Image to Design Alignment
19 Aug 20
Methods and systems for selecting one or more design files for use in test image to design alignment are provided.
Bjorn Brauer
Filed: 6 Nov 19
Utility
Plasmonic Photocathode Emitters at Ultraviolet and Visible Wavelengths
19 Aug 20
A photocathode emitter can include a transparent substrate, a photocathode layer, and a plasmonic structure array disposed between the transparent substrate and the photocathode layer.
Katerina Ioakeimidi, Gildardo R. Delgado, Frances Hill, Gary V. Lopez Lopez, Miguel A. Gonzalez, Alan D. Brodie
Filed: 12 Feb 20
Utility
Misregistration Measurements Using Combined Optical and Electron Beam Technology
19 Aug 20
A misregistration metrology system useful in manufacturing semiconductor device wafers including an optical misregistration metrology tool configured to measure misregistration at at least one target between two layers of a semiconductor device which is selected from a batch of semiconductor device wafers which are intended to be identical, an electron beam misregistration metrology tool configured to measure misregistration at the at least one target between two layers of a semiconductor device which is selected from the batch and a combiner operative to combine outputs of the optical misregistration metrology tool and the electron beam misregistration metrology tool to provide a combined misregistration metric.
Roie Volkovich, Liran Yerushalmi, Nadav Gutman
Filed: 3 Jun 19
Utility
Delivery of Light into a Vacuum Chamber Using an Optical Fiber
19 Aug 20
A system for laser enhanced voltage contrast using an optical fiber is provided.
Emanuel Saerchen, Donald W. Pettibone, Oscar Florendo, Li-Min Chen, Martin Brutsch
Filed: 21 Nov 19
Utility
System, Method and Non-transitory Computer Readable Medium for Tuning Sensitivies Of, and Determining a Process Window For, a Modulated Wafer
12 Aug 20
A system, method, and non-transitory computer readable medium are provided for tuning sensitivities of, and determining a process window for, a modulated wafer.
David Craig Oram, Abhinav Mathur, Kenong Wu, Eugene Shifrin
Filed: 28 Apr 20