262 patents
Utility
Method and apparatus for depositing a material
16 Jan 24
A method is for depositing a dielectric material on to a substrate in a chamber by pulsed DC magnetron sputtering with a pulsed DC magnetron device which produces one or more primary magnetic fields.
Stephen R Burgess, Rhonda Hyndman, Amit Rastogi, Eduardo Paulo Lima, Clive L Widdicks, Paul Rich, Scott Haymore, Daniel Cook
Filed: 31 Dec 20
Utility
Accuracy improvements in optical metrology
2 Jan 24
Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements.
Barak Bringoltz, Evgeni Gurevich, Ido Adam, Yoel Feler, Dror Alumot, Yuval Lamhot, Noga Sella, Yaron De Leeuw, Tal Yaziv, Eltsafon Ashwal-Island, Lilach Saltoun, Tom Leviant
Filed: 18 Feb 21
Utility
Axially adjusted, non-rotating barrel fiber collimator
28 Nov 23
Systems and methods for adjusting a distance of an optical fiber end to a lens assembly are provided.
Edgardo H. Engracia, Jr., Ariel Faynerman, Robert Cosmas
Filed: 12 Dec 19
Utility
Encapsulated instrumented substrate apparatus for acquiring measurement parameters in high temperature process applications
21 Nov 23
An apparatus includes an instrumented substrate apparatus, a substrate assembly including a bottom and top substrate mechanically coupled, an electronic assembly, a nested enclosure assembly including an outer and inner enclosure wherein the outer enclosure encloses the inner enclosure and the inner enclosure encloses the electronic assembly.
Mei Sun, Earl Jensen, Jing G Zhou, Ran Liu
Filed: 28 Oct 19
Utility
Optical near-field metrology
14 Nov 23
Systems and methods are provided which utilize optical microcavity probes to map wafer topography by near-field interactions therebetween in a manner which complies with high volume metrology requirements.
Yuri Paskover, Amnon Manassen, Vladimir Levinski
Filed: 19 May 17
Utility
PE-CVD apparatus and method
31 Oct 23
A capacitively coupled Plasma Enhanced Chemical Vapour Deposition (PE-CVD) apparatus has a chamber, a first electrode with a substrate support positioned in the chamber, a second electrode with a gas inlet structure positioned in the chamber, and an RF power source connected to the gas inlet structure for supplying RF power thereto.
Stephen Burgess, Kathrine Crook, Daniel Archard, William Royle, Euan Alasdair Morrison
Filed: 8 Jan 21
Utility
Measurement of overlay error using device inspection system
10 Oct 23
A method and system for measuring overlay in a semiconductor manufacturing process comprise capturing an image of a feature in an article at a predetermined manufacturing stage, deriving a quantity of an image parameter from the image and converting the quantity into an overlay measurement.
Choon Hoong Hoo, Fangren Ji, Amnon Manassen, Liran Yerushalmi, Antonio Mani, Allen Park, Stilian Pandev, Andrei Shchegrov, Jon Madsen
Filed: 1 Feb 21
Utility
Apparatus for plasma dicing
26 Sep 23
An apparatus is for plasma dicing a semiconductor substrate of the type forming part of a workpiece, the workpiece further including a carrier sheet on a frame member, where the carrier sheet carries the semiconductor substrate.
Gautham Ragunathan, David Tossell, Oliver Ansell
Filed: 30 Apr 19
Utility
Process-induced distortion prediction and feedforward and feedback correction of overlay errors
19 Sep 23
Systems and methods for prediction and measurement of overlay errors are disclosed.
Pradeep Vukkadala, Haiguang Chen, Jaydeep K. Sinha, Sathish Veeraraghavan
Filed: 5 Aug 19
Utility
DC magnetron sputtering
8 Aug 23
A method of depositing a film on a substrate is provided.
Scott Haymore, Amit Rastogi, Rhonda Hyndman, Steve Burgess, Ian Moncrieff
Filed: 27 Apr 21
Utility
Device-like metrology targets
25 Jul 23
Metrology targets, production processes and optical systems are provided, which enable metrology of device-like targets.
Vladimir Levinski, Amnon Manassen, Eran Amit, Nuriel Amir, Liran Yerushalmi, Amit Shaked
Filed: 8 Mar 22
Utility
Apparatus and method
25 Jul 23
A white light illumination source can illuminate a region of a substrate to be plasma etched with an incident light beam.
Oliver Ansell, Harry Gordon-Moys
Filed: 21 Aug 20
Utility
Cross layer common-unique analysis for nuisance filtering
4 Jul 23
Common events between layers on a semiconductor wafer are filtered.
Bjorn Brauer
Filed: 27 Sep 21
Utility
Pattern centric process control
4 Jul 23
Pattern centric process control is disclosed.
Chenmin Hu, Khurram Zafar, Ye Chen, Yue Ma, Rong Lv, Justin Chen, Abhishek Vikram, Yuan Xu, Ping Zhang
Filed: 5 Apr 21
Utility
Inspection and metrology using broadband infrared radiation
30 May 23
Systems and methods for measuring or inspecting semiconductor structures using broadband infrared radiation are disclosed.
Yung-Ho Alex Chuang, Vahid Esfandyarpour, John Fielden, Baigang Zhang, Yinying Xiao Li
Filed: 26 Oct 17
Utility
Method and apparatus for plasma etching
30 May 23
A structure comprising a substrate and a component which forms involatile metal etch products is plasma etched.
Huma Ashraf, Kevin Riddell, Codrin Prahoveanu
Filed: 15 Nov 20
Utility
Apparatus for the exposure of plate-shaped workpieces with high throughput
23 May 23
A movable table system comprising two identical tables on a common rail arrangement having a linear rail region underneath a detection unit and a processing unit, and therefore the tables can be alternatingly moved in a straight line along the common rail arrangement, in the same table-movement direction, fully underneath the detection unit and processing unit, and can be independently controlled by a computer unit.
Steffen Ruecker, Uwe Klowsky
Filed: 11 Dec 19
Utility
Apparatus for electrochemically processing semiconductor substrates
9 May 23
A method of processing a semiconductor wafer is provided.
John MacNeil, Martin Ayres, Trevor Thomas
Filed: 24 Jun 21
Utility
Accelerated training of a machine learning based model for semiconductor applications
14 Feb 23
Methods and systems for accelerated training of a machine learning based model for semiconductor applications are provided.
Kris Bhaskar, Laurent Karsenti, Scott Young, Mohan Mahadevan, Jing Zhang, Brian Duffy, Li He, Huajun Ying, Hung Nien, Sankar Venkataraman
Filed: 29 Dec 16
Utility
Diagnostic systems and methods for deep learning models configured for semiconductor applications
14 Feb 23
Methods and systems for performing diagnostic functions for a deep learning model are provided.
Jing Zhang, Ravi Chandra Donapati, Mark Roulo, Kris Bhaskar
Filed: 1 Sep 17