262 patents
Page 4 of 14
Utility
Off-axis illumination overlay measurement using two-diffracted orders imaging
22 Mar 22
Metrology methods and tools are provided, which enhance the accuracy of the measurements and enable simplification of the measurement process as well as improving the correspondence between the metrology targets and the semiconductor devices.
Yoni Shalibo, Yuri Paskover, Vladimir Levinski, Amnon Manassen, Shlomo Eisenbach, Gilad Laredo, Ariel Hildesheim
Filed: 14 Dec 18
Utility
Systems and methods for predicting defects and critical dimension using deep learning in the semiconductor manufacturing process
15 Mar 22
An initial inspection or critical dimension measurement can be made at various sites on a wafer.
Arpit Yati
Filed: 16 Nov 17
Utility
Wafer inspection using difference images
8 Mar 22
Systems and methods increase the signal to noise ratio of optical inspection of wafers to obtain higher inspection sensitivity.
Abdurrahman Sezginer, Xiaochun Li, Pavan Kumar, Junqing Huang, Lisheng Gao, Grace H. Chen, Yalin Xiong, Hawren Fang
Filed: 4 May 18
Utility
Boron-based capping layers for EUV optics
8 Mar 22
Disclosed herein are optical elements and methods for making the same.
Gildardo R Delgado, Shannon B Hill, Zefram Marks
Filed: 16 May 19
Utility
System and method for pumping laser sustained plasma with an illumination source having modified pupil power distribution
1 Mar 22
A system for generating pump illumination for laser sustained plasma (LSP) is disclosed.
Ilya Bezel, Matthew Derstine, Andrey Stepanov, Nikolay Sherbak
Filed: 9 Nov 18
Utility
Inspection of reticles using machine learning
22 Feb 22
Disclosed are methods and apparatus for inspecting a photolithographic reticle.
Hawren Fang, Abdurrahman Sezginer, Rui-fang Shi
Filed: 27 Nov 18
Utility
Machine learning in metrology measurements
15 Feb 22
Metrology methods and targets are provided, that expand metrological procedures beyond current technologies into multi-layered targets, quasi-periodic targets and device-like targets, without having to introduce offsets along the critical direction of the device design.
Eran Amit
Filed: 6 Dec 17
Utility
Resistivity probes with curved portions
15 Feb 22
Resistivity probes can be used to test integrated circuits.
Walter H. Johnson, III, Nanchang Zhu, Xianghua Liu, Jianli Cui, Zhu-bin Shi, Zhuoxian Zhang, Haiyang You, Lu Yu, Jianou Shi, Fan Zhang
Filed: 10 Nov 19
Utility
Method of depositing silicon nitride
15 Feb 22
A method is for depositing silicon nitride by plasma-enhanced chemical vapour deposition (PECVD).
Kathrine Crook, Steve Burgess
Filed: 15 Aug 19
Utility
Method and system for correlating optical images with scanning electron microscopy images
8 Feb 22
The correlation of optical images with SEM images includes acquiring a full optical image of a sample by scanning the sample with an optical inspection sub-system, storing the full optical image, identifying a location of a feature-of-interest present in the full optical image with an additional sources, acquiring an SEM image of a portion of the sample that includes the feature at the identified location with a SEM tool, acquiring an optical image portion at the location identified by the additional source, the image portions including a reference structure, correlating the image portion and the SEM image based on the presence of the feature-of-interest and the reference structure in both the image portions and the SEM image, and transferring a location of the feature-of-interest in the SEM image into the coordinate system of the image portion of the full optical image to form a corrected optical image.
Hucheng Lee, Lisheng Gao, Jan Lauber, Yong Zhang
Filed: 11 Jul 19
Utility
Apparatus and method for processing a substrate
1 Feb 22
An apparatus for electrochemically processing a semiconductor substrate includes a processing chamber of the type that is sealable to a peripheral portion of a semiconductor substrate so as to define a covered processing volume.
Martin Ayres, John MacNeil, Trevor Thomas
Filed: 10 Apr 20
Utility
Diagnostic methods for the classifiers and the defects captured by optical tools
1 Feb 22
Wafer inspection with stable nuisance rates and defect of interest capture rates are disclosed.
Martin Plihal, Erfan Soltanmohammadi, Saravanan Paramasivam, Sairam Ravu, Ankit Jain, Prasanti Uppaluri, Vijay Ramachandran
Filed: 7 Dec 17
Utility
Expediting spectral measurement in semiconductor device fabrication
1 Feb 22
A device and method for expediting spectral measurement in metrological activities during semiconductor device fabrication through interferometric spectroscopy of white light illumination during calibration, overlay, and recipe creation.
Vincent Immer, Tal Marciano, Etay Lavert
Filed: 21 Jul 20
Utility
Semiconductor inspection and metrology systems for distributing job among the CPUs or GPUs based on logical image processing boundaries
1 Feb 22
Real-time job distribution software architectures for high bandwidth, hybrid processor computation systems for semiconductor inspection and metrology are disclosed.
Ajay Gupta, Sankar Venkataraman, Sashi Balasingam, Mohan Mahadevan
Filed: 14 May 18
Utility
Method of measuring misregistration of semiconductor devices
18 Jan 22
A method of measuring misregistration in the manufacture of semiconductor devices including providing a multilayered semiconductor device, using a scatterometry metrology tool to perform misregistration measurements at multiple sites on the multilayered semiconductor device, receiving raw misregistration data for each of the misregistration measurements, thereafter providing filtered misregistration data by removing outlying raw misregistration data points from the raw misregistration data for each of the misregistration measurements, using the filtered misregistration data to model misregistration for the multilayered semiconductor device, calculating correctables from the modeled misregistration for the multilayered semiconductor device, providing the correctables to the scatterometry metrology tool, thereafter recalibrating the scatterometry metrology tool based on the correctables and measuring misregistration using the scatterometry metrology tool following the recalibration.
Roie Volkovich, Ido Dolev
Filed: 28 Jan 21
Utility
Passivation of nonlinear optical crystals
18 Jan 22
A laser system includes a nonlinear optical (NLO) crystal, wherein the NLO crystal is annealed within a selected temperature range.
Yung-Ho Alex Chuang, Vladimir Dribinski
Filed: 27 Feb 19
Utility
Swath selection for semiconductor inspection
11 Jan 22
A semiconductor-inspection method is performed by a semiconductor-inspection system.
Bosuk Kang
Filed: 11 Sep 18
Utility
Probe for testing an electrical property of a test sample
4 Jan 22
A probe for direct nano- and micro-scale electrical characterization of materials and semi conductor wafers.
Lior Shiv
Filed: 2 Mar 18
Utility
Method of depositing a SiN film
4 Jan 22
A method of depositing a SiN film onto a flexible substrate includes providing the flexible substrate, and depositing the SiN film onto the flexible substrate in a plasma enhanced chemical vapour deposition (PECVD) process using SiH4, N2 and H2, in which the temperature of the substrate is 200° C. or less and SiH4 is introduced into the PECVD process at a flow rate of greater than 100 sccm.
Mark Carruthers
Filed: 25 Apr 19
Utility
Repeater defect detection
21 Dec 21
Defects from a hot scan can be saved, such as on persistent storage, random access memory, or a split database.
Eugene Shifrin, Bjorn Brauer, Sumit Sen, Ashok Mathew, Sreeram Chandrasekaran, Lisheng Gao
Filed: 10 Apr 20