7578 patents
Page 10 of 379
Utility
Methods and apparatus for physical vapor deposition (PVD) dielectric deposition
12 Dec 23
Methods and apparatus for reducing burn-in time of a physical vapor deposition shield, including: sputtering a dielectric target having a first dielectric constant to form a dielectric layer upon an inner surface of a shield, wherein the shield includes an aluminum oxide coating having a second dielectric constant in an amount sufficient to reduce the burn-in time, and wherein the first dielectric constant and second dielectric constant are substantially similar.
Jothilingam Ramalingam, William Fruchterman
Filed: 16 Aug 20
Utility
High density carbon films for patterning applications
12 Dec 23
Embodiments of the present disclosure generally relate to deposition of high transparency, high-density carbon films for patterning applications.
Eswaranand Venkatasubramanian, Samuel E. Gottheim, Pramit Manna, Abhijit Basu Mallick
Filed: 4 Oct 19
Utility
Spot heating by moving a beam with horizontal rotary motion
12 Dec 23
Embodiments of the present disclosure generally relate to apparatus and methods for semiconductor processing, more particularly, to a thermal process chamber.
Shu-Kwan Danny Lau, Toshiyuki Nakagawa, Zhiyuan Ye
Filed: 8 Jul 20
Utility
Detecting outliers at a manufacturing system using machine learning
12 Dec 23
Methods and systems for detecting outliers at a manufacturing system using machine learning are provided.
Bharath Ram Sundar, Raman K Nurani, Ramkishore Sankarasubramanian, Ramachandran Subramanian, Bharath Muralidharan, Ramaswamy Melatoor Narayanan, Ganapathi Raman Sankaranarayanan
Filed: 4 Feb 21
Utility
Seal mechanisms for load ports
12 Dec 23
The disclosure describes devices and systems for a two-sided seal for a load port, and methods for using said seal.
Douglas B. Baumgarten, Paul B. Reuter, James C Hansen
Filed: 24 Sep 21
Utility
Process kit ring adaptor
12 Dec 23
A process kit ring adaptor includes one or more upper surfaces and one or more lower surfaces.
Leon Volfovski, Andreas Schmid, Denis Martin Koosau, Nicholas Michael Kopec, Steven Babayan, Douglas R. McAllister, Helder Lee, Jeffrey Hudgens, Damon K. Cox
Filed: 29 Mar 21
Utility
Methods for forming elongated contact hole ends
12 Dec 23
Disclosed is a semiconductor processing approach wherein a wafer twist is employed to increase etch rate, at select locations, along a hole or space end arc.
Glen F. R. Gilchrist, Shurong Liang
Filed: 13 May 22
Utility
Methods for transfer of micro-devices
12 Dec 23
An apparatus for positioning micro-devices on a substrate includes one or more supports to hold a donor substrate and a destination substrate, an adhesive dispenser to deliver adhesive on micro-devices on the donor substrate, a transfer device including a transfer surface to transfer the micro-devices from the donor substrate to the destination substrate, and a controller.
Mingwei Zhu, Sivapackia Ganapathiappan, Boyi Fu, Hou T. Ng, Nag B. Patibandla
Filed: 11 Feb 22
Utility
Selective low temperature epitaxial deposition process
12 Dec 23
A method for the selective formation of epitaxial layers is described herein.
Chen-Ying Wu, Abhishek Dube, Yi-Chiau Huang
Filed: 15 Apr 21
Utility
Ruthenium Carbide for Dram Capacitor Mold Patterning
7 Dec 23
Methods of forming electronic devices and film stacks comprising depositing a ruthenium carbide hard mask on a capacitor mold formed on a substrate.
Han Wang, Gene H. Lee, Yu Yang, Jing Zhang
Filed: 6 Jun 23
Utility
Plasma Chamber with Gas Cross-flow, Microwave Resonators and a Rotatable Pedestal for Multiphase Cyclic Deposition
7 Dec 23
A plasma treatment chamber comprises a chamber body having an opening in a top surface thereof.
Anantha Subramani, Yang Guo, Seyyed Fazeli, Kelvin Chan, Chandrashekara Baginagere, Brian Alvarez, Philip Kraus
Filed: 7 Jun 22
Utility
Throttle Valve and Foreline Cleaning Using a Microwave Source
7 Dec 23
Exemplary semiconductor processing systems may include a processing chamber defining a processing region.
Khokan Chandra Paul, Truong Van Nguyen, Kelvin Chan, Diwakar Kedlaya, Anantha K. Subramani, Abdul Aziz Khaja, Vijet Patil, Yusheng Fang, Liangfa Hu, Prashant Kumar Kulshreshtha
Filed: 6 Jun 22
Utility
Ion Source Having Different Modes of Operation
7 Dec 23
An ion source that is capable of different modes of operation is disclosed.
Graham Wright, Shardul S. Patel
Filed: 7 Jun 22
Utility
Face-up Wafer Electrochemical Planarization Apparatus
7 Dec 23
Exemplary substrate electrochemical planarization apparatuses may include a chuck body defining a substrate support surface.
Kevin H. Song, Benedict W. Pang
Filed: 6 Jun 22
Utility
Methods of Parallel Transfer of Micro-devices Using Treatment
7 Dec 23
A method of transferring micro-devices includes selectively treating a first adhesive layer to form a treated portion and an untreated portion while micro-devices are attached the first adhesive layer.
Manivannan Thothadri, Arvinder Chadha
Filed: 16 Aug 23
Utility
RNA retrieval process for preparing formalin-fixed, paraffin-embedded (FFPE) tissue samples for in situ hybridization
7 Dec 23
This disclosure provides a technology for optimally retrieving and presenting RNA in tissue samples for analysis by in situ hybridization, simultaneously preserving morphological and antigenic features of the tissues.
Erica, Mei Ling Teo
Filed: 5 Jun 23
Utility
Acoustic Monitoring of CMP Retaining Ring
7 Dec 23
A chemical mechanical polishing apparatus includes a platen supporting a polishing pad, a carrier head to hold a surface of a substrate against the polishing pad, an acoustic sensor supported on the platen, and a motor to generate relative motion between the platen and the carrier head so as to polish the substrate.
Haoquan Fang, Thomas H. Osterheld, Benjamin Cherian, Jun Qian, Kun Xu, Sohrab Pourmand, Boguslaw A. Swedek, Jeonghoon Oh, Dominic J. Benvegnu, Brian J. Brown
Filed: 6 Oct 22
Utility
Hardware to Prevent Bottom Purge Incursion In Application Volume and Process Gas Diffusion Below Heater
7 Dec 23
Exemplary semiconductor processing chambers may include a substrate support including a top surface.
Nitin Pathak, Tuan A. Nguyen, Amit Bansal, Badri N. Ramamurthi, Thomas Rubio, Juan Carlos Rocha-Alvarez
Filed: 8 May 23
Utility
Determining Substrate Orientation with Acoustic Signals
7 Dec 23
A chemical mechanical polishing apparatus includes a platen to support a polishing pad, a carrier head to hold a surface of a substrate against the polishing pad, a motor to generate relative motion between the platen and the carrier head so as to polish an overlying layer on the substrate, an in-situ acoustic monitoring system comprising an acoustic sensor that receives acoustic signals from the surface of the substrate, and a controller configured to determine a angular orientation of the substrate based on received acoustic signals from the in-situ acoustic monitoring system.
Nicholas A. Wiswell, Benjamin Cherian, Jun Qian, Thomas H. Osterheld
Filed: 10 Oct 22
Utility
Determining Substrate Precession with Acoustic Signals
7 Dec 23
A chemical mechanical polishing apparatus includes a platen to support a polishing pad, a carrier head to hold a surface of a substrate against the polishing pad, a motor to generate relative motion between the platen and the carrier head so as to polish an overlying layer on the substrate, an in-situ acoustic monitoring system comprising an acoustic sensor that receives acoustic signals from the surface of the substrate, and a controller configured to determine an angular orientation of the substrate based on received acoustic signals from the in-situ acoustic monitoring system.
Nicholas A. Wiswell, Benjamin Cherian, Jun Qian, Thomas H. Osterheld
Filed: 10 Oct 22