7578 patents
Page 7 of 379
Utility
Apparatus and Methods for Controlling Ion Energy Distribution
28 Dec 23
Embodiments of the present disclosure generally relate to apparatus and methods for controlling an ion energy distribution during plasma processing.
Linying CUI, James ROGERS
Filed: 11 Sep 23
Utility
Defect Free Germanium Oxide Gap Fill
21 Dec 23
Methods for forming defect-free gap fill materials comprising germanium oxide are disclosed.
Huiyuan Wang, Susmit Singha Roy, Takehito Koshizawa, Bo Qi, Abhijit Basu Mallick
Filed: 5 Sep 23
Utility
Polishing Carrier Head with Multiple Zones
21 Dec 23
A carrier head for a polishing system includes a housing, a flexible membrane, a first plurality of pressure supply lines, a second plurality of pressure supply lines, and a valve assembly.
Steven M. Zuniga, Jay Gurusamy, Andrew J. Nagengast, Vladimir Galburt
Filed: 5 Sep 23
Utility
Pump Liner for Process Chamber
21 Dec 23
Embodiments of the present disclosure are related to directed to a pump liner for a process chamber.
Muhannad Mustafa, Sanjeev Baluja
Filed: 13 Jun 23
Utility
Roll Exchange Chamber, Roll-to-roll Processing System and Method of Continuously Providing a Flexible Substrate
21 Dec 23
A roll exchange chamber for exchanging a substrate roll is described.
Frank SCHNAPPENBERGER, Thomas LEIPNITZ
Filed: 5 Nov 20
Utility
Self-adjustable Variable Orifice Check Valve for Back Pressure Reduction
21 Dec 23
Variable orifice check valves comprising a flange with a guide pin, spring and movable plate are described.
Muhannad Mustafa, Sanjeev Baluja
Filed: 21 Jun 23
Utility
Method and Apparatus for Supplying Improved Gas Flow to a Processing Volume of a Processing Chamber
21 Dec 23
The present disclosure generally provides methods of providing at least metastable radical molecular species and/or radical atomic species to a processing volume of a process chamber during an electronic device fabrication process, and apparatus related thereto.
Vishwas Kumar PANDEY, Eric Kihara SHONO, Kartik SHAH, Christopher S. OLSEN, Agus Sofian TJANDRA, Tobin KAUFMAN-OSBORN, Taewan KIM, Hansel LO
Filed: 2 Jun 23
Utility
Controlling Light Source Wavelengths for Selectable Phase Shifts Between Pixels In Digital Lithography Systems
21 Dec 23
A digital lithography system may adjust a wavelength of the light source to compensate for tilt errors in micromirrors while maintaining a perpendicular direction for the reflected light.
Thomas L. Laidig, Christopher Bencher, Hwan J. Jeong, Uwe Hollerbach
Filed: 23 May 22
Utility
Process Kits and Related Methods for Processing Chambers to Facilitate Deposition Process Adjustability
21 Dec 23
The present disclosure relates to flow guides, process kits, and related methods for processing chambers to facilitate deposition process adjustability.
Zhepeng CONG, Ala MORADIAN, Tao SHENG, Nimrod SMITH, Ashur J. ATANOS, Vinh N. TRAN
Filed: 22 Jul 22
Utility
Model-based Parameter Adjustments for Deposition Processes
21 Dec 23
A system may include a first semiconductor processing station configured to deposit a material on a first semiconductor wafer and a chemical tank that provides liquid to the processing station during a deposition process.
Sam K. Lee, Paul R. McHugh
Filed: 24 May 22
Utility
Single Sensor Imaging Spectroscopy for Detecting Nanoparticles to Qualify Clean Chamber Parts
21 Dec 23
In one embodiment, an apparatus to identify chemical and spatial properties of nanoparticles in a semiconductor cleaning solution, comprises a broadband light source to provide an excitation beam; a focusing lens in a path of the excitation beam to form a focused excitation beam; a sample cell, the sample cell configured to hold a cleaning solution and one or more insoluble analytes-of-interest therein; a plurality of optical lens in the path of one or more fluorescence signals to focus the one or more fluorescence signals; and an imaging device, wherein the imaging device captures the one or more fluorescence signals to form a plurality of images that contain both spatial data and spectral data about the one or more insoluble analytes-of-interest.
Viswanath BAVIGADDA, Shubhayan BHATTACHARYA, Tapashree ROY, Ankur KADAM, Kiran Rangaswamy AATRE, Suraj RENGARAJAN
Filed: 13 Jun 23
Utility
Profile Shaping for Control Gate Recesses
21 Dec 23
Exemplary semiconductor structures and processing methods may include forming a first portion of a first semiconductor layer characterized by a first etch rate for an etch treatment, forming a second portion of the first semiconductor layer characterized by a second etch rate that is less than the first etch rate for the etch treatment, and forming a third portion of the first semiconductor layer characterized by a third etch rate that is greater than the second etch rate.
Akhil Singhal, Allison Yau, Sang-Jin Kim, Zeqiong Zhao, Zhijun Jiang, Deenesh Padhi, Ganesh Balasubramanian
Filed: 1 Sep 23
Utility
Inspection Recipe Optimization for Semiconductor Specimens
21 Dec 23
There is provided a system and method of optimizing an inspection recipe for inspecting a semiconductor specimen.
Paz YABBO, Boaz DUDOVICH, Bhavna GHAI, Amir BAR
Filed: 21 Jun 22
Utility
Epitaxial Silicon Channel Growth
21 Dec 23
A three-dimensional NAND flash memory structure may include solid channel cores of epitaxial silicon that are grown directly from a silicon substrate reference.
Hsiang Yu Lee, Pradeep K. Subrahmanyan
Filed: 18 May 23
Utility
Lithography Method to Form Structures with Slanted Angle
21 Dec 23
The present disclosure generally relates to methods of forming optical devices comprising nanostructures disposed on transparent substrates.
Yongan XU, Jinxin FU, Jhenghan YANG, Ludovic GODET
Filed: 1 Sep 23
Utility
Automated Metrology Method for Large Devices
21 Dec 23
A system, software application, and method for optical device metrology of optical device patterns formed from lithography stitching are provided.
Yongan XU, Jin XU, Ludovic GODET
Filed: 9 Jun 23
Utility
Deep Learning Based Adaptive Alignment Precision Metrology for Digital Overlay
21 Dec 23
Embodiments described herein relate to a system, methods, and non-transitory computer-readable mediums that accurately align subsequent patterned layers in a photoresist utilizing a deep learning model and utilizing device patterns to replace alignment marks in lithography processes.
Tamer COSKUN, Yen-Shuo LIN, Aidyn KEMELDINOV
Filed: 30 Nov 21
Utility
Smart Dynamic Load Simulator for RF Power Delivery Control System
21 Dec 23
Embodiments disclosed herein include a dynamic load simulator.
Jie Yu, Yue Guo, Kartik Ramaswamy, Tao Zhang, Shahid Rauf, John Forster, Sidharth Bhatia, Rong Gang Zheng
Filed: 17 Jun 22
Utility
Stackable Plasma Source for Plasma Processing
21 Dec 23
A system, method, and apparatus for processing substrates.
Vladimir Nagorny, Rene George
Filed: 16 Jun 22
Utility
Stackable Plasma Source for Plasma Processing
21 Dec 23
A system, method, and apparatus for processing substrates.
Vladimir Nagorny, Rene George
Filed: 16 Jun 22