4315 patents
Page 2 of 216
Utility
Batch Processing Apparatus, Systems, and Related Methods and Structures for Epitaxial Deposition Operations
18 Jan 24
The present disclosure relates to batch processing apparatus, systems, and related methods and structures for epitaxial deposition operations.
Errol Antonio C. SANCHEZ, Shu-Kwan LAU, Zuoming ZHU, Saurabh CHOPRA, Abhishek DUBE, Chandra MOHAPATRA, Alexandros ANASTASOPOULOS, Martin Jeffrey SALINAS
Filed: 2 Dec 22
Utility
Concentration Sensor for Precursor Delivery System
18 Jan 24
First sensor data indicative of a first mass flow rate of a first gas flowing to a vaporization chamber is received.
Vivek B. Shah, Varoujan Chakarian, Upendra Ummethala
Filed: 27 Sep 23
Utility
Methods of Forming Cover Lens Structures for Display Devices, and Related Apparatus and Devices
18 Jan 24
Implementations of the present disclosure relate to methods, and related apparatus and devices, of forming flexible cover lens structures for flexible or foldable display devices.
Helinda NOMINANDA, Tae Kyung WON, Han NGUYEN, Seong Ho YOO, Soo Young CHOI
Filed: 13 Jul 22
Utility
Carbon Hardmask Opening Using Boron Nitride Mask
11 Jan 24
Exemplary semiconductor processing methods may include providing an oxygen-containing precursor to a processing region of a semiconductor processing chamber.
Jeong Hwan Kim, Yeonju Kwak, Qian Fu, Siyu Zhu, Chuanxi Yang, Hang Yu
Filed: 11 Jul 22
Utility
Control of Processing Parameters During Substrate Polishing Using Constrained Cost Function
11 Jan 24
Controlling a polishing system includes receiving from an in-situ monitoring system, for each region of a plurality of regions on a substrate being processed by the polishing system, a sequence of characterizing values for the region.
Benjamin Cherian, Sivakumar Dhandapani
Filed: 20 Sep 23
Utility
Selective Capping of Contact Layer for Cmos Devices
11 Jan 24
A method of forming an electrical contact in a semiconductor structure includes performing a patterning process to form a hard mask on a semiconductor structure comprising a first semiconductor region, a second semiconductor region, a dielectric layer having a first opening over the first semiconductor region and a second opening over the second semiconductor region, wherein the hard mask covers an exposed surface of the first semiconductor region within the first opening, performing a first selective deposition process to form a contact layer on the exposed surface of the second semiconductor region within the second opening, and performing a second selective deposition process to form a cap layer on the contact layer.
Nicolas Louis BREIL, Avgerinos V. GELATOS, Balasubramanian PRANATHARTHIHARAN
Filed: 6 Jun 23
Utility
Electrostatic Chuck Cover Piece to Enable Processing of Dielectric Substrates
11 Jan 24
Apparatus for processing a semiconductor substrate are described herein.
Andrew CEBALLOS, Suraj YADAV, Kazuya DAITO
Filed: 7 Jul 23
Utility
INTEGRATING STRAIN SiGe CHANNEL PMOS FOR GAA CMOS TECHNOLOGY
11 Jan 24
Horizontal gate-all-around devices and methods of manufacturing same are described.
Sai Hooi Yeong, Jody A. Fronheiser, Benjamin Colombeau, Balasubramanian Pranatharthiharan, El Mehdi Bazizi, Ashish Pal
Filed: 10 Jul 23
Utility
Continuous Liner for Use In a Processing Chamber
11 Jan 24
A processing chamber includes a chamber body defining an interior volume and including an access port.
James D. Carducci, Kenneth S. Collins, Kartik Ramaswamy
Filed: 20 Sep 23
Utility
Method to Optimize Post Deposition Baking Condition of Photo Resistive Materials
11 Jan 24
Embodiments disclosed herein include a method of optimizing a post deposition bake of a photoresist layer.
LUISA BOZANO, PAOLA DE CECCO, BEKELE WORKU, LAKMAL CHARIDU KALUTARAGE, RUIYING HAO
Filed: 1 Jun 23
Utility
Sustainability Monitoring Platform with Sensor Support
11 Jan 24
In embodiments, a method includes receiving, by a processing device, first sensor data generated by a plurality of sensors of a process chamber of a manufacturing system during execution of a fabrication process.
Ala Moradian, Aleksey Yanovich, Orlando Trejo, Elizabeth Neville, Dinesh Saigal, Umesh Madhav Kelkar
Filed: 4 Nov 22
Utility
Use of Adaptive Replacement Maps In Digital Lithography for Local Cell Replacement
11 Jan 24
Embodiments described herein relate to a system, software, and a method of using the system to edit a design to be printed by a lithography system.
Aravind INUMPUDI, Thomas L. LAIDIG
Filed: 20 Sep 23
Utility
Methods, Systems, and Apparatus for Interlocking a Device
11 Jan 24
In embodiments, systems and apparatus comprise a bracket having a through hole configured to receive a first connector connected to a panel spaced from the bracket, the bracket movable between first and second positions; a switch mountable on the panel, the switch having first and second switch positions; and at least one compression spring extending from the bracket to bias the bracket into the first position spaced away from the switch.
Vijay SINGH, Kumaresan NAGARAJAN, Adarsh BALAREDDY
Filed: 11 Jul 22
Utility
Ultraviolet and Ozone Clean System
11 Jan 24
A cleaning apparatus for cleaning a substrate includes a lamp for emitting ultraviolet radiation in an irradiation region; a housing that houses the lamp; a water deflector spaced below the housing, the water deflector having a water inlet for receiving a supply of ozonated water and a water outlet for discharging ozonated water irradiated by the lamp into a substrate processing region beneath the water deflector, and defining a water flow path between the water inlet and the water outlet, the water flow path extending in the irradiation region; an upper reflector extending along and above the lamp; and a lower reflector extending along and below the water deflector, wherein the upper reflector and the lower reflector at least partially define the irradiation region and reflect ultraviolet radiation toward the water flow path, and wherein the lower reflector shields the substrate from ultraviolet radiation emitted by the lamp.
Banqiu WU, Khalid MAKHAMREH, Hiroki OGAWA, Eliyahu Shlomo DAGAN
Filed: 20 Sep 23
Utility
Prevention of Contamination of Substrates During Gas Purging
11 Jan 24
Disclosed are implementations for efficient purging of substrate carriers (and content held therein) and preventing external contaminants from entering a gas purge apparatus by coupling the gas purge apparatus to a substrate carrier, performing a first gas purging session of an environment of the substrate carrier, receiving a first signal of a first signal type, responsive to receiving the first signal, keeping the gas purge apparatus coupled to the substrate carrier, performing a second gas purging session of the environment of the substrate carrier, receiving a second signal of a second signal type, and, responsive to receiving the second signal, decoupling the purge apparatus from the substrate carrier.
Douglas Brian Baumgarten, Russell Kaplan, Amitabh Puri, Paul B. Reuter
Filed: 25 Sep 23
Utility
Flat Susceptor with Grid Pattern and Venting Grooves on Surface Thereof
11 Jan 24
A susceptor for use in a processing chamber for supporting a wafer includes a susceptor substrate having a susceptor ledge on an outer circumferential edge of a front side of the susceptor substrate, wherein a pocket within the susceptor ledge is configured to hold a wafer to be processed in a processing chamber, and a coating layer deposited on the susceptor substrate, wherein a surface of the susceptor ledge is textured with a plurality of venting groove lines, a surface of the pocket is textured with a first pattern, and a surface of a back side of the susceptor substrate opposite the front side is textured with a second pattern.
Zhepeng CONG, Balakrishnam R. JAMPANA, Masato ISHII, Shawn Joseph BONHAM, James M. AMOS, Kirk Allen FISHER, Philip Michael AMOS, Cathryne A. RYAN, Aimee S. ERHARDT, Xinning LUAN, Hui CHEN
Filed: 8 Jul 22
Utility
Nitrogen Plasma Treatment for Bottom-up Growth
11 Jan 24
A method of forming a semiconductor device structure includes forming a nucleation layer within at least one feature.
Tsung-Han YANG, Zhimin QI, Yongqian GAO, Rongjun WANG, Yi XU, Yu LEI, Xingyao GAO, Chih-Hsun HSU, Xi CEN, Wei LEI, Shiyu YUE, Aixi ZHANG, Kai WU, Xianmin TANG
Filed: 21 Jun 23
Utility
Contact Formation Process for Cmos Devices
11 Jan 24
A method of forming an electrical contact in a semiconductor structure includes performing a patterning process to form a mask on a semiconductor structure, the semiconductor structure comprising a first semiconductor region, a second semiconductor region, a dielectric layer having a first opening over the first semiconductor region and a second opening over the second semiconductor region, wherein the mask covers an exposed surface of the second semiconductor region within the second opening, performing an amorphization ion implant process to amorphize an exposed surface of the first semiconductor region within the first opening, performing a removal process to remove the mask, performing a selective epitaxial deposition process, to epitaxially form a contact layer on the exposed surface of the second semiconductor region, and performing a recrystallization anneal process to recrystallize the amorphized surface of the first semiconductor region.
Nicolas Louis BREIL, Lisa MCGILL, Amritha RAMMOHAN, Shashank SHARMA
Filed: 5 Jun 23
Utility
Technique for Training Neural Network for Use In In-situ Monitoring During Polishing and Polishing System
11 Jan 24
A method of polishing a substrate includes polishing a conductive layer on the substrate at a polishing station, monitoring the layer with an in-situ eddy current monitoring system to generate a plurality of measured signals values for a plurality of different locations on the layer, generating thickness measurements the locations, and detecting a polishing endpoint or modifying a polishing parameter based on the thickness measurements.
Kun Xu, Kiran Lall Shrestha, Doyle E. Bennett, David Maxwell Gage, Benjamin Cherian, Jun Qian, Harry Q. Lee
Filed: 21 Sep 23
Utility
Methods and Systems for Producing Lithium Intercalated Anodes
11 Jan 24
Embodiments of the present disclosure generally relate to battery technology, and more specifically, methods and systems for preparing lithium anodes.
PrasannaKalleshwara Buddappa RAMACHANDRAPPA, Sambhu Nath KUNDU, Visweswaren SIVARAMAKRISHNAN, Subramanya P. HERLE
Filed: 19 May 23