4315 patents
Page 5 of 216
Utility
Process Kits and Related Methods for Processing Chambers to Facilitate Deposition Process Adjustability
21 Dec 23
The present disclosure relates to flow guides, process kits, and related methods for processing chambers to facilitate deposition process adjustability.
Zhepeng CONG, Ala MORADIAN, Tao SHENG, Nimrod SMITH, Ashur J. ATANOS, Vinh N. TRAN
Filed: 22 Jul 22
Utility
Model-based Parameter Adjustments for Deposition Processes
21 Dec 23
A system may include a first semiconductor processing station configured to deposit a material on a first semiconductor wafer and a chemical tank that provides liquid to the processing station during a deposition process.
Sam K. Lee, Paul R. McHugh
Filed: 24 May 22
Utility
Single Sensor Imaging Spectroscopy for Detecting Nanoparticles to Qualify Clean Chamber Parts
21 Dec 23
In one embodiment, an apparatus to identify chemical and spatial properties of nanoparticles in a semiconductor cleaning solution, comprises a broadband light source to provide an excitation beam; a focusing lens in a path of the excitation beam to form a focused excitation beam; a sample cell, the sample cell configured to hold a cleaning solution and one or more insoluble analytes-of-interest therein; a plurality of optical lens in the path of one or more fluorescence signals to focus the one or more fluorescence signals; and an imaging device, wherein the imaging device captures the one or more fluorescence signals to form a plurality of images that contain both spatial data and spectral data about the one or more insoluble analytes-of-interest.
Viswanath BAVIGADDA, Shubhayan BHATTACHARYA, Tapashree ROY, Ankur KADAM, Kiran Rangaswamy AATRE, Suraj RENGARAJAN
Filed: 13 Jun 23
Utility
Profile Shaping for Control Gate Recesses
21 Dec 23
Exemplary semiconductor structures and processing methods may include forming a first portion of a first semiconductor layer characterized by a first etch rate for an etch treatment, forming a second portion of the first semiconductor layer characterized by a second etch rate that is less than the first etch rate for the etch treatment, and forming a third portion of the first semiconductor layer characterized by a third etch rate that is greater than the second etch rate.
Akhil Singhal, Allison Yau, Sang-Jin Kim, Zeqiong Zhao, Zhijun Jiang, Deenesh Padhi, Ganesh Balasubramanian
Filed: 1 Sep 23
Utility
Inspection Recipe Optimization for Semiconductor Specimens
21 Dec 23
There is provided a system and method of optimizing an inspection recipe for inspecting a semiconductor specimen.
Paz YABBO, Boaz DUDOVICH, Bhavna GHAI, Amir BAR
Filed: 21 Jun 22
Utility
Epitaxial Silicon Channel Growth
21 Dec 23
A three-dimensional NAND flash memory structure may include solid channel cores of epitaxial silicon that are grown directly from a silicon substrate reference.
Hsiang Yu Lee, Pradeep K. Subrahmanyan
Filed: 18 May 23
Utility
Lithography Method to Form Structures with Slanted Angle
21 Dec 23
The present disclosure generally relates to methods of forming optical devices comprising nanostructures disposed on transparent substrates.
Yongan XU, Jinxin FU, Jhenghan YANG, Ludovic GODET
Filed: 1 Sep 23
Utility
Automated Metrology Method for Large Devices
21 Dec 23
A system, software application, and method for optical device metrology of optical device patterns formed from lithography stitching are provided.
Yongan XU, Jin XU, Ludovic GODET
Filed: 9 Jun 23
Utility
Deep Learning Based Adaptive Alignment Precision Metrology for Digital Overlay
21 Dec 23
Embodiments described herein relate to a system, methods, and non-transitory computer-readable mediums that accurately align subsequent patterned layers in a photoresist utilizing a deep learning model and utilizing device patterns to replace alignment marks in lithography processes.
Tamer COSKUN, Yen-Shuo LIN, Aidyn KEMELDINOV
Filed: 30 Nov 21
Utility
Smart Dynamic Load Simulator for RF Power Delivery Control System
21 Dec 23
Embodiments disclosed herein include a dynamic load simulator.
Jie Yu, Yue Guo, Kartik Ramaswamy, Tao Zhang, Shahid Rauf, John Forster, Sidharth Bhatia, Rong Gang Zheng
Filed: 17 Jun 22
Utility
Stackable Plasma Source for Plasma Processing
21 Dec 23
A system, method, and apparatus for processing substrates.
Vladimir Nagorny, Rene George
Filed: 16 Jun 22
Utility
Stackable Plasma Source for Plasma Processing
21 Dec 23
A system, method, and apparatus for processing substrates.
Vladimir Nagorny, Rene George
Filed: 16 Jun 22
Utility
Closed-loop Control of Plasma Source Via Feedback from Laser Absorption Species Sensor
21 Dec 23
Embodiments disclosed herein include a semiconductor processing tool.
Abdullah Zafar, Kelvin Chan, Philip Allan Kraus
Filed: 15 Jun 22
Utility
Reaction Cell for Species Sensing
21 Dec 23
Embodiments disclosed herein include semiconductor processing tools.
Abdullah Zafar, Kelvin Chan, Philip Allan Kraus
Filed: 15 Jun 22
Utility
Dopant Diffusion with Short High Temperature Anneal Pulses
21 Dec 23
A method and apparatus for diffusing a dopant within a semiconductor device is described.
Wolfgang R. ADERHOLD
Filed: 16 Jun 22
Utility
Diagnostic Disc with a High Vacuum and Temperature Tolerant Power Source
21 Dec 23
A method includes causing, by a computing system comprising at least one processing device, a diagnostic disc placed within a processing chamber to generate sensor data of at least one component of the processing chamber using a set of non-contact sensors of the diagnostic disc, receiving, by the computing system, the sensor data from the diagnostic disc via a wireless connection established between the computing system and the diagnostic disc, determining, by the computing system based on the sensor data, whether at least one of alignment concentricity is skewed with respect to the at least one component, and in response to determining that at least one of alignment or concentricity is skewed with respect to the at least one component, initiating, by the computing system, correction of at least one of alignment or concentricity of the at least one component.
Phillip A. Criminale, Zhiqiang Guo, Andrew Myles, Martin Perez-Guzman, Nelson Joseph Gaspard, Timothy Joseph Franklin, Michael A. Stearns
Filed: 6 Sep 23
Utility
Electronic Device Manufacturing System
21 Dec 23
An electronic device manufacturing system includes a mainframe including a transfer chamber and facets defining side walls of the transfer chamber.
Michael Robert Rice, Jeffrey C. Hudgens
Filed: 6 Feb 23
Utility
Memory Cell Selector for High-voltage Set and Reset Operations
14 Dec 23
A selector for a memory cell in a memory array may operate by opening different conductive paths to high and low voltages during set and reset operations.
Frank Tzen-Wen Guo
Filed: 13 Jun 22
Utility
Molten Liquid Transport for Tunable Vaporization In Ion Sources
14 Dec 23
An ion source with a crucible is disclosed.
Craig R. Chaney, Graham Wright
Filed: 8 Jun 22
Utility
Uniform In Situ Cleaning and Deposition
14 Dec 23
Exemplary semiconductor processing systems may include an output manifold that defines at least one plasma outlet.
Saket Rathi, Tuan A. Nguyen, Amit Bansal, Yuxing Zhang, Badri N. Ramamurthi, Nitin Pathak, Abdul Aziz Khaja, Sarah Michelle Bobek
Filed: 28 Aug 23