4315 patents
Page 7 of 216
Utility
Determining Substrate Orientation with Acoustic Signals
7 Dec 23
A chemical mechanical polishing apparatus includes a platen to support a polishing pad, a carrier head to hold a surface of a substrate against the polishing pad, a motor to generate relative motion between the platen and the carrier head so as to polish an overlying layer on the substrate, an in-situ acoustic monitoring system comprising an acoustic sensor that receives acoustic signals from the surface of the substrate, and a controller configured to determine a angular orientation of the substrate based on received acoustic signals from the in-situ acoustic monitoring system.
Nicholas A. Wiswell, Benjamin Cherian, Jun Qian, Thomas H. Osterheld
Filed: 10 Oct 22
Utility
Hardware to Prevent Bottom Purge Incursion In Application Volume and Process Gas Diffusion Below Heater
7 Dec 23
Exemplary semiconductor processing chambers may include a substrate support including a top surface.
Nitin Pathak, Tuan A. Nguyen, Amit Bansal, Badri N. Ramamurthi, Thomas Rubio, Juan Carlos Rocha-Alvarez
Filed: 8 May 23
Utility
Methods of Parallel Transfer of Micro-devices Using Treatment
7 Dec 23
A method of transferring micro-devices includes selectively treating a first adhesive layer to form a treated portion and an untreated portion while micro-devices are attached the first adhesive layer.
Manivannan Thothadri, Arvinder Chadha
Filed: 16 Aug 23
Utility
Acoustic Monitoring of CMP Retaining Ring
7 Dec 23
A chemical mechanical polishing apparatus includes a platen supporting a polishing pad, a carrier head to hold a surface of a substrate against the polishing pad, an acoustic sensor supported on the platen, and a motor to generate relative motion between the platen and the carrier head so as to polish the substrate.
Haoquan Fang, Thomas H. Osterheld, Benjamin Cherian, Jun Qian, Kun Xu, Sohrab Pourmand, Boguslaw A. Swedek, Jeonghoon Oh, Dominic J. Benvegnu, Brian J. Brown
Filed: 6 Oct 22
Utility
Determining Substrate Precession with Acoustic Signals
7 Dec 23
A chemical mechanical polishing apparatus includes a platen to support a polishing pad, a carrier head to hold a surface of a substrate against the polishing pad, a motor to generate relative motion between the platen and the carrier head so as to polish an overlying layer on the substrate, an in-situ acoustic monitoring system comprising an acoustic sensor that receives acoustic signals from the surface of the substrate, and a controller configured to determine an angular orientation of the substrate based on received acoustic signals from the in-situ acoustic monitoring system.
Nicholas A. Wiswell, Benjamin Cherian, Jun Qian, Thomas H. Osterheld
Filed: 10 Oct 22
Utility
Acoustic Monitoring of Conditioner During Polishing
7 Dec 23
A chemical mechanical polishing apparatus includes a platen to support a polishing pad, a conditioner head to hold a conditioner disk in contact with the polishing pad, a motor to generate relative motion between the polishing pad and the conditioner disk so as to condition the polishing pad, an in-situ acoustic monitoring system having an acoustic sensor to receive acoustic signals from the conditioner disk, and a controller configured to analyze a signal from the acoustic sensor and determine a characteristic of the conditioner disk or conditioner head based on the signal.
Thomas H. Osterheld, Benjamin Cherian, Jun Qian, Haoquan Fang, Nicholas A. Wiswell, Sohrab Pourmand, Jeonghoon Oh, Brian J. Brown
Filed: 23 Sep 22
Utility
Monitoring of Acoustic Events on a Substrate
7 Dec 23
A chemical mechanical polishing apparatus, including a platen supporting a polishing pad; a carrier head to hold a surface of a substrate against the polishing pad; a motor to generate relative motion between the platen and the carrier head so as to polish an overlying layer on the substrate; an array of acoustic sensors arranged within the carrier head to receive acoustic signals from the surface of the substrate; and a controller configured to detect a position of an acoustic event on the surface of the substrate based on received acoustic signals from the array of acoustic sensors.
Upendra Ummethala, Nicholas A. Wiswell, David Masayuki Ishikawa, Sohrab Pourmand, Benjamin Cherian, Thomas H. Osterheld, Jeonghoon Oh, Jianshe Tang
Filed: 2 Jun 23
Utility
In-situ Conditioner Disk Cleaning During CMP
7 Dec 23
A polishing system includes a platen to hold a polishing pad, a carrier head to hold a substrate against the polishing pad, a conditioner including a conditioner head to hold a conditioner disk against the polishing pad, a motor to move the conditioner head laterally movable relative to the platen, a conditioning disk cleaning station positioned adjacent the platen to clean the conditioning disk, and a controller configured to cause the motor to, during polishing of the substrate, move the conditioner head back and forth between a first position with the conditioner head over the polishing pad and a second position with the conditioner head in the conditioner disk cleaning station.
Haosheng Wu, Shou-Sung Chang, Jianshe Tang, Jeonghoon Oh, Chad Pollard, Chih Chung Chou, Ningzhuo Cui, Hui Chen
Filed: 17 Oct 22
Utility
Holding Arrangement for Holding a Substrate, Carrier for Supporting a Substrate, Vacuum Processing System, Method for Holding a Substrate, and Method for Releasing a Substrate
7 Dec 23
The present disclosure provides a holding arrangement.
Simon LAU
Filed: 24 Aug 23
Utility
Emissivity Independence Tuning
7 Dec 23
Embodiments disclosed herein include a method of calibrating a processing tool.
Wolfgang Aderhold
Filed: 3 Jun 22
Utility
System for Automatic Tumor Detection and Classification
7 Dec 23
Certain aspects of the present disclosure provide techniques for automatically detecting and classifying tumor regions in a tissue slide.
Parijat Prakash PRABHUDESAI, Ganesh Kumar MOHANUR RAGHUNATHAN, Sumit Kumar JHA, Aditya SISTA, Narasimha Murthy CHANDAN
Filed: 12 Jun 23
Utility
Oled Anode Structures Including Amorphous Transparent Conducting Oxides and Oled Processing Method Comprising the Same
30 Nov 23
Exemplary methods of OLED device processing are described.
Chung-Chia Chen, Yu-Hsin Lin, Jungmin Lee, Takuji Kato, Dieter Haas, Si Kyoung Kim, Ji Young Choung
Filed: 11 Nov 22
Utility
Spin-orbit Torque Mram Structure and Manufacture Thereof
30 Nov 23
Embodiments of the present disclosure generally include spin-orbit torque magnetoresistive random-access memory (SOT-MRAM) devices and methods of manufacture thereof.
Minrui YU, Wenhui WANG, Jaesoo AHN, Jong Mun KIM, Sahil PATEL, Lin XUE, Chando PARK, Mahendra PAKALA, Chentsau Chris YING, Huixiong DAI, Christopher S. NGAI
Filed: 8 Aug 23
Utility
Systems and Methods for Optimizing Full Horizontal Scanned Beam Distance
30 Nov 23
Provided herein are approaches for optimizing a full horizontal scanned beam distance of an accelerator beam.
Tyler Wills, George M. Gammel, Eric Donald Wilson, Jay T. Scheuer, Xiangdong He, Shardul Patel, Robert C. Lindberg
Filed: 27 May 22
Utility
Process Kits and Related Methods for Processing Chambers to Facilitate Deposition Process Adjustability
30 Nov 23
The present disclosure relates to flow guides, process kits, and related methods for processing chambers to facilitate deposition process adjustability.
Zhepeng CONG, Ala MORADIAN, Tao SHENG, Nimrod SMITH, Ashur J. ATANOS, Vinh N. TRAN
Filed: 22 Jul 22
Utility
Low Temperature Silicon Oxide Gap Fill
30 Nov 23
Embodiments of the disclosure relate to methods for forming silicon based gapfill within substrate features.
Soham Asrani, Bhargav S. Citla, Srinivas D. Nemani, Ellie Y. Yieh
Filed: 27 May 22
Utility
RepublicationDeposition of Semiconductor Integration Films
30 Nov 23
Embodiments disclosed herein include methods of depositing a metal oxo photoresist using dry deposition processes.
Lakmal Charidu Kalutarage, Mark Joseph Saly, Bhaskar Jyoti Bhuyan, Thomas Joseph Knisley, Kelvin Chan, Regina Germanie Freed, David Michael Thompson, Susmit Singha Roy, Madhur Sachan
Filed: 16 Dec 22
Utility
Ga Implant Process Control for Enhanced Particle Performance
30 Nov 23
A method of reducing gallium particle formation in an ion implanter.
Frank Sinclair, Bon-Woong Koo, Tseh-Jen Hsieh, Gregory E. Stratoti
Filed: 19 Apr 23
Utility
Process Kits and Related Methods for Processing Chambers to Facilitate Deposition Process Adjustability
30 Nov 23
The present disclosure relates to flow guides, process kits, and related methods for processing chambers to facilitate deposition process adjustability.
Zhepeng CONG, Ala MORADIAN, Tao SHENG, Nimrod SMITH, Ashur J. ATANOS, Vinh N. TRAN
Filed: 22 Jul 22
Utility
Highly Conformal Metal Etch In High Aspect Ratio Semiconductor Features
30 Nov 23
Exemplary semiconductor processing methods may include providing an oxygen-containing precursor to a semiconductor processing chamber, where a substrate may be positioned.
Xiaolin C. Chen, Baiwei Wang, Rohan Puligoru Reddy, Wanxing Xu, Zhenjiang Cui, Anchuan Wang
Filed: 27 May 22