72 patents
Page 2 of 4
Utility
Wafer inspection system including a laser triangulation sensor
14 Feb 23
One example of an inspection system includes a laser, a magnification changer, and a first camera.
John Schaefer, Christopher Voges, Nicholas Smith, Jeffrey Treptau
Filed: 8 Jun 18
Utility
Multiple Camera Apparatus for Photolithographic Processing
9 Feb 23
Embodiments of a photolithographic machine with two or more camera systems (i.e., projection lens systems) are described herein.
Elvino DaSilveira, J. Casey Donaher, Douglas A. Brown
Filed: 4 Aug 21
Utility
Low Contrast Non-referential Defect Detection
19 Jan 23
Disclosed herein are examples of defect detection techniques for inspecting semiconductor devices, such as CMOS image sensors, during the manufacturing process.
Roman S. Basistyy, Jatinder Dhaliwal, Jian Ding
Filed: 18 Jul 22
Utility
System and method for optimizing a lithography exposure process
20 Dec 22
A method for correcting misalignments is provided.
Elvino da Silveira, Keith F. Best, Wayne Fitzgerald, Jian Lu, Xin Song, J. Casey Donaher, Christopher J. McLaughlin
Filed: 20 Aug 21
Utility
Effective Cell Approximation Model for Logic Structures
10 Nov 22
Characteristics of a standard logic cell, e.g., a random logic cell, are determined using an effective cell approximation.
Kevin Eduard HEIDRICH, Nicholas James KELLER
Filed: 5 May 21
Utility
Fabrication Fingerprint for Proactive Yield Management
20 Oct 22
Systems and methods for improving wafer fabrication.
Prasad Bachiraju
Filed: 20 Apr 22
Utility
Multi-layer Calibration for Empirical Overlay Measurement
13 Oct 22
Overlay is determined for a device using signals measured from the device and a signal response to overlay determined from a plurality of calibration targets.
Nigel P. SMITH, Francis Scott HOOVER, Nicholas James KELLER, Kevin Eduard Heidrich
Filed: 29 Mar 22
Utility
Opto-acoustic Measurement of a Transparent Film Stack
6 Oct 22
A non-destructive opto-acoustic metrology device detects the presence and location of non-uniformities in a film stack that includes a large number, e.g., 50 or more, transparent layers.
George Andrew Antonelli, Manjusha S. Mehendale, Robin Mair, Nicholas James Keller
Filed: 30 Mar 21
Utility
Non-destructive Inspection and Manufacturing Metrology Systems and Methods
21 Jul 22
Measuring or inspecting samples through non-destructive systems and methods.
Manjusha MEHENDALE, Marco ALVES, Robin MAIR
Filed: 22 May 20
Utility
Beamsplitter based ellipsometer focusing system
12 Jul 22
An ellipsometer includes a focusing system that uses an image of the measurement spot to determine a best focal position for the ellipsometer.
John F. Lesoine
Filed: 1 Oct 19
Utility
Interferometry with pixelated color discriminating elements combined with pixelated polarization masks
7 Jun 22
A pixelated color mask is combined with a pixelated polarization mask in dynamic interferometry.
Neal Brock, James Millerd, Erik Novak, Brad Kimbrough
Filed: 1 Feb 19
Utility
Conformal stage
7 Jun 22
An improved stage for the processing of large, thin substrates, such as glass and semiconductor panels.
J. Casey Donaher, Edward J. Ficarra, Christopher J. McLaughlin
Filed: 21 Dec 18
Utility
Vortex Polarimeter
2 Jun 22
An optical metrology device uses a multi-wavelength beam of light that has azimuthally varying polarization states and/or phase states, referred to as a vortex beam.
Kenneth E. James, John F. Lesoine, Pedro Vagos
Filed: 2 Dec 20
Utility
Focus System for Oblique Optical Metrology Device
2 Jun 22
The light from an optical metrology device is focused into a measurement spot on a sample using a focusing system.
Amit SHACHAF, Daniel Thompson, John F. Lesoine
Filed: 2 Dec 20
Utility
Vortex polarimeter
31 May 22
An optical metrology device uses a multi-wavelength beam of light that has azimuthally varying polarization states and/or phase states, referred to as a vortex beam.
Kenneth E. James, John F. Lesoine, Pedro Vagos
Filed: 2 Dec 20
Utility
Fast generalized multi-wavelength ellipsometer
31 May 22
An ellipsometer uses a broadband light source and a Fresnel cone to produce a simultaneous broadband polarization state generator with no moving parts.
Alexander George Boosalis
Filed: 20 Feb 20
Utility
Focus system for oblique optical metrology device
31 May 22
The light from an optical metrology device is focused into a measurement spot on a sample using a focusing system.
Amit Shachaf, Daniel Thompson, John F. Lesoine
Filed: 2 Dec 20
Utility
Wafer singulation process control
26 Apr 22
A method for monitoring and controlling a substrate singulation process is described.
Wayne Fitzgerald
Filed: 23 Dec 16
Utility
Active damper for semiconductor metrology and inspection systems
22 Mar 22
A damper for a semiconductor metrology or inspection system includes a pair of parallel plates with a fluid with a variable viscosity retained between plates.
Paul A. Doyle, Mark James Franceschi, Morgan A. Crouch, Kenneth E. James
Filed: 24 May 19
Utility
System and Method for Optimizing a Lithography Exposure Process
10 Mar 22
A method for correcting misalignments is provided.
Elvino da Silveira, Keith F. Best, Wayne Fitzgerald, Jian Lu, Xin Song, J. Casey Donaher, Christopher J. McLaughlin
Filed: 20 Aug 21