72 patents
Page 3 of 4
Utility
On-axis dynamic interferometer and optical imaging systems employing the same
1 Mar 22
An optical device for characterizing a workpiece combines an interferometer with a polarization rotation pellicle, installed in a stand-alone fashion in a spatial gap between the mirrors of the interferometer, and a polarization based phase-shift sensor.
James Millerd, Eric Frey
Filed: 11 Jul 19
Utility
Optical metrology device using numerical aperture reduction
2 Nov 21
A metrology device that can determine at least one characteristics of a sample is disclosed.
George Andrew Antonelli, Troy Daniel Ribaudo, Michael J. Hammond
Filed: 13 May 20
Utility
Target for Optical Measurement of Trenches
21 Oct 21
A metrology target is designed for measuring a feature at the bottom of a trench in a device under test, such as a tungsten recess vertical profile in a wordline in a three-dimensional (3D) NAND.
Nicholas JAMES KELLER, George Andrew ANTONELLI
Filed: 15 Apr 21
Utility
Sample surface polarization modification in interferometric defect inspection
19 Oct 21
Defects are detected using data acquired from an interference channel and a polarization modification channel in an interferometer.
Nigel P. Smith
Filed: 13 Jul 20
Utility
Characterization of Patterned Structures Using Acoustic Metrology
14 Oct 21
Systems and methods for inspecting or characterizing samples, such as by characterizing patterned features or structures of the sample.
Manjusha Mehendale, Michael Kotelyanskii, Priya Mukundhan, Robin Mair
Filed: 30 Mar 21
Utility
Enhanced Heat Transfer In Liquefied Gas Cooled Detector
7 Oct 21
A horizontal Dewar flask is used with an optical metrology device, which may advantageously reduce the vertical height of the device.
James GIVENS
Filed: 3 Apr 20
Utility
System and method for optimizing a lithography exposure process
21 Sep 21
A method for correcting misalignments is provided.
Elvino Da Silveira, Keith Frank Best, Wayne Fitzgerald, Jian Lu, Xin Song, J. Casey Donaher, Christopher J. McLaughlin
Filed: 28 Sep 18
Utility
Fast Generalized Multi-wavelength Ellipsometer
26 Aug 21
An ellipsometer uses a broadband light source and a Fresnel cone to produce a simultaneous broadband polarization state generator with no moving parts.
Alexander George Boosalis
Filed: 20 Feb 20
Utility
System and Method for Correcting Overlay Errors In a Lithographic Process
26 Aug 21
As feature sizes of semiconductor chips shrink there is a need for tighter overlay between layers in a lithography process.
Zhiyang LI, Tong YANG
Filed: 19 Feb 21
Utility
Calibration of azimuth angle for optical metrology stage using grating-coupled surface plasmon resonance
3 Aug 21
Grating-coupled surface plasmon resonance response of a calibration grating is used to calibrate the azimuth angle offset between a sample on the stage and the plane of incidence (POI) of the optical system of an optical metrology device.
Nicholas James Keller
Filed: 11 Sep 20
Utility
Beamsplitter Based Ellipsometer Focusing System
1 Apr 21
An ellipsometer includes a focusing system that uses an image of the measurement spot to determine a best focal position for the ellipsometer.
John F. Lesoine
Filed: 1 Oct 19
Utility
Sample Surface Polarization Modification In Interferometric Defect Inspection
25 Mar 21
Defects are detected using data acquired from an interference channel and a polarization modification channel in an interferometer.
Nigel P. SMITH
Filed: 13 Jul 20
Utility
Sub-resolution defect detection
2 Mar 21
An optical metrology device, such as an interferometer, detects sub-resolution defects on a sample, i.e., defects that are smaller than a pixel in the detector array of the interferometer.
Nigel P. Smith
Filed: 21 Nov 18
Utility
Sample inspection using topography
2 Mar 21
Defects are detected using surface topography data.
Nigel P. Smith, Holly M. Edmundson, Michael A. Gilmore
Filed: 21 Nov 18
Utility
Non-adhesive mounting assembly for a tall Rochon polarizer
9 Feb 21
An elongated rectangular Rochon polarizer, e.g., having a height to width or depth ratio of at least 2.5, is securely held in a non-adhesive mounting assembly.
Andrew Saul Klassen, Paul Doyle
Filed: 2 Mar 18
Utility
Optical metrology system using infrared wavelengths
26 Jan 21
An optical metrology device produces beams of light with varying wavelengths in a spectral range for measurement of a sample that is at least partially transparent to the spectral range.
George Andrew Antonelli, Troy Daniel Ribaudo
Filed: 13 Mar 19
Utility
Conformal Stage
23 Dec 20
An improved stage for the processing of large, thin substrates, such as glass and semiconductor panels.
J. Casey DONAHER, Edward J. FICARRA, Christopher J. MCLAUGHLIN
Filed: 20 Dec 18
Utility
Active Damper for Semiconductor Metrology and Inspection Systems
25 Nov 20
A damper for a semiconductor metrology or inspection system includes a pair of parallel plates with a fluid with a variable viscosity retained between plates.
Paul A. DOYLE, Mark James Franceschi, Morgan A. Crouch, Kenneth E. James
Filed: 23 May 19
Utility
Optical Metrology Device Using Numerical Aperture Reduction
18 Nov 20
A metrology device that can determine at least one characteristics of a sample is disclosed.
George Andrew Antonelli, Troy Daniel Ribaudo, Michael J. Hammond
Filed: 12 May 20
Utility
Laser Triangulation Sensor System and Method for Wafer Inspection
11 Nov 20
Systems and methods for measuring a dimension of a 3D structure of a semiconductor device, such as height of a pad or bump supported by a film layer.
John Schaefer
Filed: 5 Nov 18