72 patents
Page 4 of 4
Utility
Interferometer with pixelated phase shift mask
9 Nov 20
An interferometer uses a phase shift mask that includes an array of pixels that are aligned with a corresponding array of pixels of a detector.
Nigel P. Smith
Filed: 20 Nov 18
Utility
Separated Axis Lithographic Tool
21 Oct 20
A stepper (100) for lithographic processing of semiconductor substrates includes abase (102), a chuck (104) that moves only along an X axis of a coordinate system, a bridge (114) mounted over the base and the chuck, and at least one projection camera (112) mounted on the bridge.
J. Casey DONAHER
Filed: 25 Dec 18
Utility
FOUP purge shield
21 Sep 20
A load port for loading wafers to and unloading wafers from a front opening unified pod (FOUP) includes a shield member that covers and provides a seal over an opening of the FOUP.
Paul A. Doyle, Morgan A. Crouch
Filed: 26 Jul 18
Utility
Light source failure identification in an optical metrology device
14 Sep 20
An optical metrology device produces light in a spectral range for measurement of a sample using a tunable Quantum Cascade Laser (QCL).
George Andrew Antonelli, Troy Daniel Ribaudo
Filed: 12 Mar 19
Utility
High Resolution Stage Positioner
9 Sep 20
A mechanism for localizing a substrate relative to a projection camera or other apparatus over large travel distances is described.
J. Casey DONAHER
Filed: 12 Sep 18
Utility
Optical metrology device for measuring samples having thin or thick films
17 Aug 20
An optical metrology device includes an aperture that can be adjusted based on the thickness of the film on a sample.
Jeffrey T. Fanton
Filed: 6 Dec 18
Utility
System and Method for Optimizing a Lithography Exposure Process
22 Jul 20
A method for correcting misalignments is provided.
Elvino DA SILVEIRA, Keith Frank BEST, Wayne FITZGERALD, Jian LU, Xin SONG, J. Casey DONAHER, Christopher J. MCLAUGHLIN
Filed: 27 Sep 18
Utility
Optical Metrology Device for Measuring Samples Having Thin or Thick Films
10 Jun 20
An optical metrology device includes an aperture that can be adjusted based on the thickness of the film on a sample.
Jeffrey T. Fanton
Filed: 6 Dec 18
Utility
Correction of angular error of plane-of-incidence azimuth of optical metrology device
13 Apr 20
Optical metrology is used to calibrate the plane-of-incidence (POI) azimuth error by determining and correcting an azimuth angle offset.
Pedro Vagos, Ye Feng, Daniel Thompson, Yan Zhang
Filed: 19 May 19
Utility
Surface height determination of transparent film
10 Feb 20
A surface topography of a sample with a transparent surface layer is measured using surface topographies of a reference sample.
Graham M. Lynch
Filed: 26 Aug 18
Utility
Local purge within metrology and inspection systems
21 Oct 19
A purge system includes a purge gas distribution manifold that includes at least one port through which light beam from an optical metrology or inspection head is transmitted.
Paul A. Doyle, Ryan Tsai, Morgan A. Crouch
Filed: 30 May 18
Utility
Sample Inspection Using Topography
2 Oct 19
Defects are detected using surface topography data.
Nigel P. SMITH, Holly M. EDMUNDSON, Michael A. GILMORE
Filed: 20 Nov 18